10112-08-0 Usage
Description
(Fluoromethyl)silane, with the chemical formula CH3SiF3, is a colorless, flammable gas characterized by a pungent odor. It is a versatile chemical compound that finds applications in various industries due to its unique properties.
Uses
Used in Organic Synthesis:
(Fluoromethyl)silane is used as a reagent for the introduction of the trimethylsilyl group into organic compounds. This application is valuable in the synthesis of various organic molecules, enhancing the versatility of chemical reactions and the properties of the resulting products.
Used in Microelectronics:
In the microelectronics industry, (Fluoromethyl)silane serves as a precursor for the deposition of silicon-based thin films. These films are essential components in the manufacturing of semiconductor devices, contributing to the performance and efficiency of electronic systems.
Used in Semiconductor Manufacturing:
(Fluoromethyl)silane is also utilized as a source of fluorine for plasma etching in semiconductor manufacturing. This process is critical for the precise shaping and patterning of semiconductor materials, ensuring the high-quality production of microelectronic components.
Safety Considerations:
Given its flammability and potential to cause respiratory irritation, (Fluoromethyl)silane is classified as a hazardous chemical. It should be handled with caution in controlled laboratory or industrial settings to ensure the safety of personnel and the integrity of the environment.
Check Digit Verification of cas no
The CAS Registry Mumber 10112-08-0 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 1,0,1,1 and 2 respectively; the second part has 2 digits, 0 and 8 respectively.
Calculate Digit Verification of CAS Registry Number 10112-08:
(7*1)+(6*0)+(5*1)+(4*1)+(3*2)+(2*0)+(1*8)=30
30 % 10 = 0
So 10112-08-0 is a valid CAS Registry Number.
10112-08-0Relevant articles and documents
The synthesis and properties of (CH2F)SiH3 and related monofluoromethylsilanes
Buerger, H.,Moritz, P.
, p. 293 - 308 (2007/10/02)
The reduction of (CFCl2)SiCl3 by LiAlH4, Me3SnH, and (nBu)3SnH has been studied.The compound (CH2F)SiH3 (I) and all the compounds of the series (CFCl2-mHm)SiCl3-nHn, m = 0, 1 and n = 0-3 were detected and characterized by NMR spectroscopy.Conditions for the synthesis of I, (CHFCl)SiH3 (IX) and (CFCl2)SiH3 (V) with acceptable yields have been optimized.These novel compounds were studied by 1H, 19F, 13C and 29Si NMR spectroscopy; their infrared and Raman spectra were recorded and assigned with the assistance of a normal coordinate analysis of 1 and its isotopomer (CD2F)SiD3.The thermolyses of I, IX and (CHF2)SiH3 (X) which start at about 120, 200 and 180 deg C, respectively, have been studied.Whereas I decomposes by a migration of F from C to Si, compound X undergoes elimination of the carbene CHF, insertion of which into SiH bonds ultimately gives CH3Si derivatives.
