165662-68-0 Usage
General Description
3-Benzyloxy-4-methylbenzoic acid is a chemical compound with a structure that includes a benzylic ether and a carboxylic acid group. It is characterized by the presence of a benzene ring that is linked to an oxygen atom through a carbon atom, also connected to another benzene ring which has a methyl group and carboxylic acid group attached. The essence of its structure gives it a range of reactivity, making it potentially useful in several chemical reactions and syntheses. As an organic compound, it also belongs to the class of phenylpropanoids and polyketides. Other than its structural and chemical properties, specific details about its applications, uses, or safety measures may vary and hence, need to be referred from material safety data sheets or specialized literature.
Check Digit Verification of cas no
The CAS Registry Mumber 165662-68-0 includes 9 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 6 digits, 1,6,5,6,6 and 2 respectively; the second part has 2 digits, 6 and 8 respectively.
Calculate Digit Verification of CAS Registry Number 165662-68:
(8*1)+(7*6)+(6*5)+(5*6)+(4*6)+(3*2)+(2*6)+(1*8)=160
160 % 10 = 0
So 165662-68-0 is a valid CAS Registry Number.
InChI:InChI=1/C15H14O3/c1-11-7-8-13(15(16)17)9-14(11)18-10-12-5-3-2-4-6-12/h2-9H,10H2,1H3,(H,16,17)
165662-68-0Relevant articles and documents
HETEROCYCLIC INHIBITORS OF PCSK9
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, (2018/10/24)
This application relates to chemical compounds which may act as inhibitors of, or which may otherwise modulate the activity of, PCSK9, or a pharmaceutically acceptable salt, solvate, prodrug or polymorph thereof, and to compositions and formulations comprising such compounds, and methods of using and making such compounds. Compounds include compounds of Formula (I): (I) wherein A, D and Q are described herein.
Deep ultraviolet absorbent and its use in pattern formation
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, (2008/06/13)
A deep ultraviolet absorbent comprising at least one compound having one or more glycidyl groups in the molecule and at least one anthracene derivative, and a solvent capable of dissolving these compounds is effective for preventing reflection of deep ultraviolet light from a substrate during formation of resist pattern, resulting in forming ultra-fine patterns without causing notching and halation.
