20602-03-3Relevant articles and documents
SALT, ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
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Paragraph 0220, (2020/09/01)
PROBLEM TO BE SOLVED: To provide a salt capable of producing a resist pattern with a good mask error factor (MEF), and a resist composition containing the salt. SOLUTION: The salt represented by formula (I), an acid generator, and the resist composition containing the same are provided. [In the formula, Q1 and Q2 each represent a fluorine atom, a perfluoroalkyl group or the like; R1 and R2 each represent a hydrogen atom, a fluorine atom, a perfluoroalkyl group or the like; z represents an integer of 0-6; X1 represents *-CO-O-, *-O-CO-, *-O-CO-O- or *-O-; L1 represents a single bond or a saturated hydrocarbon group; A1 represents an optionally substituted divalent alicyclic hydrocarbon group; Ra represents an optionally substituted alicyclic hydrocarbon group, and -CH2- contained in the group may be substituted with -O-, -S-, -SO2- or -CO-, provided that at least one -CH2- contained in the alicyclic hydrocarbon group is substituted with -O- or -CO-; and Z+ represents an organic cation.] SELECTED DRAWING: None COPYRIGHT: (C)2020,JPOandINPIT