23349-86-2 Usage
Description
3-chloro-2-methylpropyl(dimethyl)amine, with the molecular formula C6H14ClN, is a chemical compound belonging to the amine family. It is a clear, colorless liquid characterized by a strong ammonia-like odor. 3-chloro-2-methylpropyl(dimethyl)amine is soluble in water and is known for its high flammability. As a member of the amine family, it serves as a crucial intermediate in the synthesis of various chemicals.
Uses
Used in Pharmaceutical Industry:
3-chloro-2-methylpropyl(dimethyl)amine is used as a chemical intermediate for the synthesis of pharmaceuticals. It plays a vital role in the production of various medications, contributing to the development of new drugs and improving existing ones.
Used in Pesticide Industry:
In the agricultural sector, 3-chloro-2-methylpropyl(dimethyl)amine is utilized as an intermediate in the manufacturing process of pesticides. Its involvement in pesticide production helps in the development of effective solutions to control pests and protect crops.
Safety Precautions:
It is important to handle 3-chloro-2-methylpropyl(dimethyl)amine with care due to its potential harmful effects if inhaled or if it comes into contact with the skin. Proper safety measures should be taken to minimize risks during its use in industrial processes.
Check Digit Verification of cas no
The CAS Registry Mumber 23349-86-2 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 2,3,3,4 and 9 respectively; the second part has 2 digits, 8 and 6 respectively.
Calculate Digit Verification of CAS Registry Number 23349-86:
(7*2)+(6*3)+(5*3)+(4*4)+(3*9)+(2*8)+(1*6)=112
112 % 10 = 2
So 23349-86-2 is a valid CAS Registry Number.
InChI:InChI=1/C6H14ClN/c1-6(4-7)5-8(2)3/h6H,4-5H2,1-3H3
23349-86-2Relevant articles and documents
THIN-FILM FORMING RAW MATERIAL FOR USE IN ATOMIC LAYER DEPOSITION METHOD, THIN-FILM FORMING RAW MATERIAL, METHOD FOR PRODUCING THIN-FILM, AND COMPOUND
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Paragraph 0105, (2021/11/05)
The present invention provides a thin-film forming raw material, which is used in an atomic layer deposition method, including a compound represented by the following general formula (1): where R1 to R4 each independently represent an alkyl group having 1 to 5 carbon atoms, and A1 represents an alkanediyl group having 1 to 5 carbon atoms.