18166-43-3 TRI-T-BU...

18166-43-3 TRI-T-BUTOXYSILANOL

18166-43-3 TRI-T-BUTOXYSILANOL

Min.Order / FOB Price:Get Latest Price

1 Kilogram

Negotiable

  • Min.Order :1 Kilogram
  • Purity: 98%
  • Payment Terms : L/C,T/T,,MoneyGram,Other

Keywords

18166-43-3 TRI-T-BUTOXYSILANOL 98%

Quick Details

  • Appearance:Solid
  • Application:General reagent/ pharmaceutical intermediates
  • PackAge:As required
  • ProductionCapacity:20|Metric Ton|Month
  • Storage:below 5° C
  • Transportation:By Sea / By Air / By Courier

Superiority:

Our company was built in 2009 with an ISO certificate.In the past 5 years, we have grown up as a famous fine chemicals supplier in China and we had established stable business relationships with Samsung, LG, Merck, Thermo Fisher Scientific and so on. Our main business covers the fields below:

 

1.Noble Metal Catalysts (Pt.Pd...)

2.Organic Phosphine Ligands (Tert-butyl-phosphine.Cyclohexyl-phosphine...)

3.OLED intermediates (Fluorene,Carbazole,Boric acid...)

4.Customs Synthesis

 

Our advantage:

 

1. Higest quality and good package 

2.Fast delivery 

3.Better payment term 

4.Fast response to customer  within 6 hours 

5.Good business credit in Europe ,US ,Japan ,Korea 

 

Anyway ,if you need any chemicals from China ,Henan Tianfu can help you

Details:

TRI-T-BUTOXYSILANOL Basic information
Product Name: TRI-T-BUTOXYSILANOL
Synonyms: TRI-T-BUTOXYSILANOL;TRIS(TERT-BUTOXY)SILANOL;TRIS(T-BUTOXY)SILANOL;Tri-tert-butoxysilanol;Silicic acid, tris(1,1-diMethylethyl) ester;Tri-tert-butyl hydrogen orthosilicate;Tri-t-butoxysilanol (99.999%-Si) PURATREM;Tri-t-butoxysilanol (99.999%-Si) PURATREM 14-7015 contained in 50 Ml Swagelokcylinder (96-1077) for CVD/ALD
CAS: 18166-43-3
MF: C12H28O4Si
MW: 264.43
EINECS:  
Product Categories: Silanes;Solution Deposition Precursors;Micro/Nanoelectronics;Organosilicon;Precursors by Metal;Precursors Packaged for Deposition SystemsOrganometallic Reagents;SilanolsVapor Deposition Precursors;Vapor Deposition Precursors;14: Silicon;Chemical Synthesis;CVD and ALD Precursors by Metal;CVD and ALD Precursors Packaged for Deposition Systems;Materials Science;Organometallic Reagents;Silanols;Silicon;Vapor Deposition Precursors
Mol File: 18166-43-3.mol
TRI-T-BUTOXYSILANOL Structure
 
TRI-T-BUTOXYSILANOL Chemical Properties
Melting point  63-65 °C(lit.)
Boiling point  205-210 °C(lit.)
density  0,92 g/cm3
Fp  >65°C
storage temp.  below 5° C
Sensitive  moisture sensitive
 
Safety Information
Risk Statements  36/37/38
Safety Statements  22-24/25
WGK Germany  3
TSCA  No

 

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