Add time:08/25/2019 Source:sciencedirect.com
Mictrostructured silicon oxide (SiOx) thin films were deposited on glass and metal substrates from 1,1,1,3,3,3-hexamethyldisilazane (HMDSN) and Hexamethyldisiloxane (cas 107-46-0) (HMDSO) by using atmospheric-pressure thermal microplasma jet. Two kinds of string-like products, randomly bent string-like products and linear string-like products, were deposited and they formed microstructured films. The bent string-like products formed labyrinth-like structures and the linear string-like products lay in parallel to form a large aligned structure. The width of both the bent and linear string-like products was from 1 to 3 μm, regardless of the kind of the precursor but depending on the plasma irradiation conditions. The influence of various surface microstructure of substrates on the formation of the SiOx microstructure was investigated to make clear the mechanism for the formation of the microstructures.
We also recommend Trading Suppliers and Manufacturers of Hexamethyldisiloxane (cas 107-46-0). Pls Click Website Link as below: cas 107-46-0 suppliers
About|Contact|Cas|Product Name|Molecular|Country|Encyclopedia
Message|New Cas|MSDS|Service|Advertisement|CAS DataBase|Article Data|Manufacturers | Chemical Catalog
©2008 LookChem.com,License: ICP
NO.:Zhejiang16009103
complaints:service@lookchem.com Desktop View