Add time:07/22/2019 Source:sciencedirect.com
The aim of this paper is to deposit ZIRCONIUM OXIDE (cas 11129-15-0) films by magnetron sputtering process at different argon partial pressure values of 45%, 55%, 62% and 67%. The effect of argon partial pressure on structural, optical and wettability properties of zirconium oxide films is investigated in this research work. The increase in argon partial pressure leads to increase in intensity of (111) peak for zirconium oxide thin films as observed by X-ray Diffraction. The average crystallite size of zirconium oxide films increases from 19 nm to 25 nm with increase in argon partial pressure. Wettability properties of zirconium oxide films such as contact angle and surface energy were determined by contact angle measuring system. The minimum transmission values above 63% were observed for all zirconium oxide thin films deposited at different argon partial pressure. Band gap and refractive index of zirconium oxide thin films varies as a function of argon partial pressure.
We also recommend Trading Suppliers and Manufacturers of ZIRCONIUM OXIDE (cas 11129-15-0). Pls Click Website Link as below: cas 11129-15-0 suppliers
About|Contact|Cas|Product Name|Molecular|Country|Encyclopedia
Message|New Cas|MSDS|Service|Advertisement|CAS DataBase|Article Data|Manufacturers | Chemical Catalog
©2008 LookChem.com,License: ICP
NO.:Zhejiang16009103
complaints:service@lookchem.com Desktop View