1064170-66-6

Basic information

• Product Name: 4-(1-(4-((6-diazo-5-oxo-5,6-dihydro-1-naphthalenyl)sulfonyl)oxyphenyl)-1-methylpropyl)phenyl 6-diazo-5-oxo-5,6-dihydro-1-naphthalenesulfonate
• CAS NO: 1064170-66-6
• Molecular Weight: 706.756
• Mol File: 1064170-66-6.mol
• Article Data: 2

Chemical Properties

• CAS DataBase Reference: 4-(1-(4-((6-diazo-5-oxo-5,6-dihydro-1-naphthalenyl)sulfonyl)oxyphenyl)-1-methylpropyl)phenyl 6-diazo-5-oxo-5,6-dihydro-1-naphthalenesulfonate(CAS DataBase Reference)
• NIST Chemistry Reference: 4-(1-(4-((6-diazo-5-oxo-5,6-dihydro-1-naphthalenyl)sulfonyl)oxyphenyl)-1-methylpropyl)phenyl 6-diazo-5-oxo-5,6-dihydro-1-naphthalenesulfonate(1064170-66-6)
• EPA Substance Registry System: 4-(1-(4-((6-diazo-5-oxo-5,6-dihydro-1-naphthalenyl)sulfonyl)oxyphenyl)-1-methylpropyl)phenyl 6-diazo-5-oxo-5,6-dihydro-1-naphthalenesulfonate(1064170-66-6)

Safety Data

• Hazardous Substances Data: 1064170-66-6(Hazardous Substances Data)

Upstream product

• 77-40-7 Bisphenol B 
• 2657-00-3 sodium 2-diazo-1-oxo-1,2-dihydronaphthalene-5-sulfonate 

Relevant articles and documents

NOVEL DIAZONAPHTHOQUINONESULFONIC ACID BISPHENOL DERIVATIVE USEFUL IN PHOTO LITHOGRAPHIC SUB MICRON PATTERNING AND A PROCESS FOR PREPARATION THEREOF

The present invention provides novel diazonaphthoquinonesulfonic acid bisphenol derivatives. More particularly, the present invention relates to photo restive coating comprising alkali-soluble resin, a photoactive compound and a surfactant. The photoresist film prepared has less then one micron. The photoactive compound is soluble or swellable in aqueous alkaline solutions and is diazonaphthoquinonesulfonic bisphenol esters of the general formula (A), wherein DNQ represents a 2-Diazo-1-naphthoquinone-4-sulfonyl, 2-Diazo-1-naphthoquinone-5-sulfonyl, 1-Diazo-2-naphthoquinone-4-sulfonyl groups and R1 R1 represents an alkyl, aryl and substituted aryl groups. The invention also provides a process for coating and imaging the light-sensitive composition.