11105-11-6 Usage
Description
Tungstic acid, also known as tungsten oxide or wolframic acid, is a chemical compound with the formula H2WO4. It is a yellow powder that is insoluble in water but soluble in hydrogen fluoride and alkalies. Tungstic acid has a white form with the formula H2WO4.H2O, which is formed by acidifying tungsten solutions in the cold. It is considered a toxic material.
Uses
Used in Chemical Industry:
Tungstic acid is used as a catalyst in various chemical reactions, such as the production of maleic anhydride and the hydrogenation of oils. Its high acidity and ability to form complexes with other elements make it a valuable catalyst in the industry.
Used in Metallurgical Industry:
Tungstic acid is used in the metallurgical industry for the refining of metals, such as aluminum and steel. It acts as a deoxidizing agent, helping to remove impurities and improve the quality of the final product.
Used in Ceramic Industry:
Tungstic acid is used in the ceramic industry as a component in the production of high-performance ceramics, such as tungsten carbide and other hard materials. Its high melting point and hardness contribute to the strength and durability of these ceramics.
Used in Electronics Industry:
Tungstic acid is used in the electronics industry for the production of thin-film transistors and other electronic components. Its semiconducting properties and ability to form thin films make it suitable for use in electronic devices.
Used in Pharmaceutical Industry:
Tungstic acid is used in the pharmaceutical industry as a starting material for the synthesis of various drugs and pharmaceutical compounds. Its chemical properties and reactivity make it a valuable component in the development of new medications.
Used in Environmental Applications:
Tungstic acid is used in environmental applications for the treatment of wastewater and the removal of heavy metals from industrial effluents. Its ability to form complexes with metal ions makes it an effective agent for the removal of pollutants from water.
Hazard
Toxic material.
Check Digit Verification of cas no
The CAS Registry Mumber 11105-11-6 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 1,1,1,0 and 5 respectively; the second part has 2 digits, 1 and 1 respectively.
Calculate Digit Verification of CAS Registry Number 11105-11:
(7*1)+(6*1)+(5*1)+(4*0)+(3*5)+(2*1)+(1*1)=36
36 % 10 = 6
So 11105-11-6 is a valid CAS Registry Number.
InChI:InChI=1/H2O.3O.W/h1H2;;;;/rO3W.H2O/c1-4(2)3;/h;1H2
11105-11-6Relevant articles and documents
Microwave–assisted synthesis of nanoscale tungsten trioxide hydrate with excellent photocatalytic activity under visible irradiation
Cai, Feng–Ying,Cao, Wei,Lü, Jian,Li, Taohai,Liu, Heng–Xin,Shen, Yanhua,Xu, Jian–Ying,Yu, Xu–Teng
, (2020)
Tungsten trioxide hydrate (WO3?1/3H2O) nanoparticles (NPs) were prepared via a microwave–assisted synthetic pathway by using Na2WO4·2H2O and PdCl2 as precursors. Microstructure and morphology of as–prepared WO3?1/3H2O NPs were investigated through X–ray diffraction (XRD), transmission electron microscopy (TEM), and Fourier transform infrared (FT–IR) spectra, while porosity and bandgap through specific surface area and UV–vis absorption spectroscopy. It was found that Pd2+ ions played a crucial role in the formation of WO3?1/3H2O NPs, and thus a possible formation mechanism was proposed based on the growth processes. The photocatalytic property of WO3?1/3H2O NPs was evaluated on the basis of Rhodamine B (RhB) degradation in aqueous solutions under simulated visible irradiation. Photocatalytic experimental results indicated that as–prepared WO3?1/3H2O NPs exhibited much more superior photocatalytic activity by contrast to that of the commercial WO3.
Improvement of electroactive β phase nucleation and dielectric properties of WO3·H2O nanoparticle loaded poly(vinylidene fluoride) thin films
Thakur, Pradip,Kool, Arpan,Bagchi, Biswajoy,Hoque, Nur Amin,Das, Sukhen,Nandy, Papiya
, p. 62819 - 62827 (2015/08/06)
Tungsten oxide hydrate (WO3·H2O) nanoparticles (NPs) have been prepared by simple hydrazine hydrate reduction. X-ray diffraction, UV-Visible spectroscopy and field emission electron scanning microscopy confirm the formation of phase pure orthorhombic WO3·H2O NPs. Thereafter, poly(vinylidene fluoride) (PVDF) thin films doped with different amounts of WO3·H2O NPs (1-15 mass%) have been prepared via a simple solution-casting method to verify the role of the NPs on the enhancement of electroactive β phase crystallization and dielectric properties of WO3·H2O NP-PVDF thin films. The interface between the NPs and the polymer matrix takes a vital role in improving β phase nucleation and dielectric properties of the WO3·H2O NP modified PVDF thin films. Strong electrostatic or ion-dipole interaction between the negatively charged NP surfaces and -CH2 dipoles of the polymer matrix at the interface effectively improves the electroactive β phase nucleation and dielectric properties of the nanocomposite thin films.
