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1190-14-3

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1190-14-3 Usage

General Description

(4-bromobutyl)phosphonic acid is a chemical compound that consists of a phosphonic acid group attached to a butyl chain with a bromine atom at the fourth position. It is commonly used as a building block in organic synthesis and as a reagent in chemical reactions. (4-bromobutyl)phosphonic acid is known for its ability to form strong, stable bonds with metal ions, making it useful in applications such as metal chelation and coordination chemistry. It can also be used as a corrosion inhibitor and as a stabilizer in various industrial processes. Additionally, (4-bromobutyl)phosphonic acid has potential applications in pharmaceuticals and agrochemicals due to its unique chemical properties. Overall, this chemical compound has a wide range of uses and is important in various industries as a versatile and effective reagent.

Check Digit Verification of cas no

The CAS Registry Mumber 1190-14-3 includes 7 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 4 digits, 1,1,9 and 0 respectively; the second part has 2 digits, 1 and 4 respectively.
Calculate Digit Verification of CAS Registry Number 1190-14:
(6*1)+(5*1)+(4*9)+(3*0)+(2*1)+(1*4)=53
53 % 10 = 3
So 1190-14-3 is a valid CAS Registry Number.

1190-14-3Downstream Products

1190-14-3Relevant articles and documents

ADSORPTION OF ORDERED ZIRCONIUM PHOSPHONATE MULTILAYER FILMS ON SILICON AND GOLD SURFACES.

Lee,Kepley,Hong,Akhter,Mallouk

, p. 2597 - 2601 (1988)

Multilayer films of zirconium 1,10-decanediylbis(phosphonate) have been prepared on silicon and gold substrates and characterized by ellipsometry, XPS, and electrochemical measurements. The deposition technique requires first covalent attachment or adsorption of a phosphonic acid anchoring agent. The functionalized substrates are exposed alternately to aqueous ZrOCl//2 and 1,10-decanediylbis(phosphonic acid) solutions to yield multilayer films. Ellipsometry shows an increase in film thickness, on Si, of 17 Angstrom/layer, which corresponds to the layer spacing in bulk Zr(O//3PC//1//0H//2//0PO//3). Variable take-off angle X-ray photoelectron spectra from four-layer films have attenuated Si peaks but strong Zr and P peaks when the detector is 70 degree off the surface normal, implying that the films on Si are continuous.

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