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12005-95-7

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12005-95-7 Usage

General Description

Manganese arsenide, also known as manganese(III) arsenide, is a chemical compound with the formula MnAs. It is a crystalline solid that is a member of the III-V semiconductor family and has potential applications in electronic and magnetic devices. Manganese arsenide is a semiconducting material with a narrow bandgap, making it suitable for use in photovoltaic and thermoelectric devices. It also exhibits interesting magnetic properties, potentially making it useful in spintronics and other magnetic technologies. However,

Check Digit Verification of cas no

The CAS Registry Mumber 12005-95-7 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 1,2,0,0 and 5 respectively; the second part has 2 digits, 9 and 5 respectively.
Calculate Digit Verification of CAS Registry Number 12005-95:
(7*1)+(6*2)+(5*0)+(4*0)+(3*5)+(2*9)+(1*5)=57
57 % 10 = 7
So 12005-95-7 is a valid CAS Registry Number.
InChI:InChI=1/As.Mn/rAsMn/c1-2

12005-95-7SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 19, 2017

Revision Date: Aug 19, 2017

1.Identification

1.1 GHS Product identifier

Product name arsanylidynemanganese

1.2 Other means of identification

Product number -
Other names Manganese arsenide

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:12005-95-7 SDS

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12005-95-7Related news

Metalorganic chemical vapour deposition of MANGANESE ARSENIDE (cas 12005-95-7) for thin film magnetic applications07/20/2019

Thin films of the ferromagnetic material manganese arsenide (MnAs) have been grown for the first time by atmospheric pressure metalorganic chemical vapour deposition (MOCVD), using tricarbonylmethylcyclopentadienyl manganese (TCM) and arsine. A detailed study of the MnAs growth characteristics a...detailed

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