12518-09-1

Basic information

• Product Name: Silyliumylidene, fluoro-
• CAS NO: 12518-09-1
• Molecular Formula: FSi
• Molecular Weight: 47.0839
• Mol File: 12518-09-1.mol
• Article Data: 4

Chemical Properties

• CAS DataBase Reference: Silyliumylidene, fluoro-(CAS DataBase Reference)
• NIST Chemistry Reference: Silyliumylidene, fluoro-(12518-09-1)
• EPA Substance Registry System: Silyliumylidene, fluoro-(12518-09-1)

Safety Data

• Hazardous Substances Data: 12518-09-1(Hazardous Substances Data)

Upstream product

• 14835-14-4 trifluorosilyl radical 
• 7783-61-1 silicon tetrafluoride 
• 14067-07-3 silicon ion 
• 13966-66-0 difluorosilylene 
• 14782-23-1 ⁽²⁰⁾Ne⁽¹⁺⁾ 

Downstream Products

• 11128-24-8 silicon monofluoride 
• 24203-25-6 xenon ⁽¹⁺⁾ 

Relevant articles and documents

Reactions of Ar+, Ne+, and He+ with SiF4 from thermal energy to 50 eV c.m.

Guided ion-beam techniques are used to measure the cross sections for reaction of SiF4 with Ar+, Ne+, and He+ from thermal to 50 eV.Charge transfer followed by loss of F atoms are the sole processes observed.All SiFx+

Electron-impact ionization cross sections of the SiF3 free radical

Absolute cross sections for electron-impact ionization of the SiF3 free radical from threshold to 200 eV are presented for formation of the parent SiF3 ion and the fragment SiF2 , SiF+, and Si+ ions.A 3 keV beam of SiF3 is prepared by near-resonant charge transfer of SiF3 with 1,3,5-trimethylbenzene.The beam contains only ground electronic state neutral radicals, but with as much as 1.5 eV of vibrational energy.The absolute cross section for formation of the parent ion at 70 eV is 0.67 +/- 0.09 Angstroem2.At 70 eV the formation of SiFi2+ is the major process, having a cross section 2.51 +/- 0.02 times larger than that of the parent ion, while the SiF+ fragment has a cross section 1.47 +/- 0.08 times larger than the parent.Threshold measurements show that ion pair dissociation processes make a significant contribution to the formation of positively charged fragment ions.