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1624-01-7

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1624-01-7 Usage

Description

TETRAKIS(DIMETHYLAMINO)SILANE, also known as tetrakis(dimethylamino)silane, is a chemical compound with the formula (Me2N)4Si. It is a colorless liquid that is highly reactive due to its four dimethylamino groups. TETRAKIS(DIMETHYLAMINO)SILANE is a precursor for the synthesis of various silicon-containing materials and has unique properties that make it useful in a range of applications.

Uses

Used in Electronics Industry:
TETRAKIS(DIMETHYAMINO)SILANE is used as a precursor for silicon dioxide thin films in the electronics industry. The application reason is that it allows for the formation of high-quality silicon dioxide thin films with excellent insulating properties, which are essential for various electronic devices and components.
Used in Chemical Vapor Deposition (CVD) Process:
TETRAKIS(DIMETHYAMINO)SILANE is used as a source material in the CVD process for producing silicon dioxide thin films. The application reason is that it reacts with ozone to form the desired thin films, which are crucial for the fabrication of semiconductor devices, solar cells, and other electronic components.
Used in Research and Development:
TETRAKIS(DIMETHYAMINO)SILANE is used as a research compound for the development of new materials and processes in the field of materials science. The application reason is its unique reactivity and ability to form a variety of silicon-containing compounds, which can be explored for potential applications in various industries.
Used in Aminosilane Synthesis:
TETRAKIS(DIMETHYAMINO)SILANE is used as a starting material for the synthesis of various aminosilanes. The application reason is that it can be easily modified and functionalized to create a range of aminosilane derivatives with different properties and potential applications in various fields, such as coatings, adhesives, and sealants.

Safety Profile

A poison by ingestion and slam contact. A severe eye irritant. When heated to decomposition it emits toxic vapors of NOx.

Check Digit Verification of cas no

The CAS Registry Mumber 1624-01-7 includes 7 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 4 digits, 1,6,2 and 4 respectively; the second part has 2 digits, 0 and 1 respectively.
Calculate Digit Verification of CAS Registry Number 1624-01:
(6*1)+(5*6)+(4*2)+(3*4)+(2*0)+(1*1)=57
57 % 10 = 7
So 1624-01-7 is a valid CAS Registry Number.
InChI:InChI=1/C8H24N4Si/c1-9(2)13(10(3)4,11(5)6)12(7)8/h1-8H3

1624-01-7 Well-known Company Product Price

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  • Alfa Aesar

  • (H27092)  Tetrakis(dimethylamino)silane, 99%   

  • 1624-01-7

  • 1g

  • 232.0CNY

  • Detail
  • Alfa Aesar

  • (H27092)  Tetrakis(dimethylamino)silane, 99%   

  • 1624-01-7

  • 10g

  • 1558.0CNY

  • Detail

1624-01-7SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 17, 2017

Revision Date: Aug 17, 2017

1.Identification

1.1 GHS Product identifier

Product name N-methyl-N-[tris(dimethylamino)silyl]methanamine

1.2 Other means of identification

Product number -
Other names Silanetetramine,octamethyl

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:1624-01-7 SDS

1624-01-7Relevant articles and documents

METHOD FOR PRODUCING DIALKYLAMINOSILANE

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Paragraph 0066-0070, (2020/05/06)

A method for safely and efficiently producing high-purity dialkylaminosilane. Dialkylamine is fed simultaneously during feeding chlorosilane in the presence of metal to cause reaction. For example, chlorosilane and dialkylamine are fed, and then only dialkylamine is fed to cause reaction, whereby dialkylaminosilane is produced.

Organometallic compound, its synthesis method, and solution raw material and metal-containing thin film containing the same

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Page 7, (2008/06/13)

The organometallic compound of the present invention is a compound that has bonds between metal atoms and nitrogen atoms or bonds between semimetal atoms and nitrogen atoms, and the content of chlorine in the compound is 200 ppm or less and the content of water is 30 ppm or less. In addition, the general formula of this compound is represented by the following formula (1): M[(R1)2N](n?s)(R2)s??(1) wherein, M represents a metal atom or semimetal atom, with the metal atom being Hf, Zr, Ta, Ti, Ce, Al, V, La, Nb or Ni, and the semimetal atom being Si, R1 represents a methyl group or ethyl group, R2 represents an ethyl group, n represents the valence of M, and s represents an integer of 0 to n?1.

Preparation of New Monomeric, Oligomeric, and Polymeric Silyl Triflates

Uhlig, Wolfram

, p. 47 - 54 (2007/10/02)

The highly reactive silyl triflates R3SiOSO2CF3 are valuable reagents in organosilicon chemistry.New triflate derivatives of mono- and oligosilanes have been prepared by substitution of phenyl groups or hydrogen atoms for the trifluoromethanesulfonyl group.The presence of the electron-withdrawing triflate group leads to a strong deactivation of the other substituents at the silicon atom, and the displacement of a second phenyl group at the same silicon atom is much slower than the first step.For this reason in the case of phenylated oligosilanes stepwisemonosubstitution of the silicon atoms has been found.Other new oligomeric silyl triflates are obtained by reaction of silanediyl(triyl) bis(tris)(trifluoromethanesulfonates) with lithium derivatives of organosilicon compounds.Finally, the cleavage of silicon - phenyl bonds of poly by CF3SO3H leads to triflate derivatives of polysilanes. Key Words: Silyl triflates / Organosilanes

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