19361-97-8Relevant articles and documents
One-pot synthesis and luminescent spectra of 3-allyl substituted quinazoline-2,4-dione derivatives as allyl capping agents
Farouk, Mahmoud,Alrokayan, Salman A.,Imran, Ahamad,Abu-Salah, Khalid M.
, p. 75 - 78 (2012)
3-Nitro-N-(phenylsulphonyloxy)phthalimide (IIIa) and N-(phenylsulphonyloxy) phthalimide (IIIb) were synthesised as key intermediates in good yield. Their structures were confirmed by 1H NMR and FTIR spectral data. The reaction of the key intermediates with allylamine produced 3-allyl-5- nitroquinazoline-2,4-(1H,3H)-dione (IVa) and 3-allylquinazoline-2,4-(1H,3H)- dione (IVb), respectively. Luminescence emission and excitation spectra of IVa and IVb are also presented.
Highly Active Manganese to C?O Cross-Coupling Reaction for the Synthesis of N-Hydroxyphthalimide Esters
Joo, Seong-Ryu,Kim, Jong-Sung,Park, Soo-Youl,Kim, Seung-Hoi
, p. 829 - 832 (2018/04/30)
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Novel anthracene derivative and radiation-sensitive resin composition
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, (2008/06/13)
A novel anthracene derivative useful as an additive to a radiation-sensitive resin composition is disclosed. The anthracene derivative has the following formula (1), wherein R1 groups individually represent a hydroxyl group or a monovalent organic group having 1-20 carbon atoms, n is an integer of 0-9, X is a single bond or a divalent organic group having 1-12 carbon atoms, and R2 represents a monovalent acid-dissociable group. The radiation-sensitive resin composition comprises the anthracene derivative of the formula (1), a resin insoluble or scarcely soluble in alkali, but becomes alkali soluble in the presence of an acid, and a photoacid generator. The composition is useful as a chemically-amplified resist for microfabrication utilizing deep ultraviolet rays, typified by a KrF excimer laser and ArF excimer laser.