196302-06-4

Basic information

• Product Name: (S)-4-(trifluoromethyl)mandelic acid
• Synonyms: (S)-4-(trifluoromethyl)mandelic acid
• CAS NO: 196302-06-4
• Molecular Weight: 220.148
• Mol File: 196302-06-4.mol
• Article Data: 3

Chemical Properties

• CAS DataBase Reference: (S)-4-(trifluoromethyl)mandelic acid(CAS DataBase Reference)
• NIST Chemistry Reference: (S)-4-(trifluoromethyl)mandelic acid(196302-06-4)
• EPA Substance Registry System: (S)-4-(trifluoromethyl)mandelic acid(196302-06-4)

Safety Data

• Hazardous Substances Data: 196302-06-4(Hazardous Substances Data)

Upstream product

• 108-05-4 vinyl acetate 
• 395-35-7 4-(trifluoromethyl)mandelic acid 
• 191720-36-2 (S)-2-hydroxy(4-trifluoromethylphenyl)acetonitrile 

Relevant articles and documents

Robust enzymatic resolution of 3-fluoromandelic acid with lipase PS supported on celite

The resolution of different mandelic acids using the lipase PS Amano SD enzyme is described. By supporting the lyophilized enzyme over Celite, both the activity and the stability of lipase PS in organic media were significantly improved, enabling the robust resolution scale-up of 3-fluoromandelic acid. The methodology was extended to produce a range of optically pure (R)-mandelic acids, avoiding tedious extractions or chromatography.

METHOD FOR PRODUCING SUBSTITUTED SHIRAL DIOLS AND DIOL-ANALOGOUS DERIVATIVES

The invention relates to a method for producing substituted shiral diols and the derivatives thereof of formula (I), wherein R is H or possibly substituted C5-C20-aryl-, C5-C20-heterocycle or C1-C20 alkyl radical or R1is possibly substituted C5-C20-aryl, C5-C20-heterocycle or C1-C20 alkyl; R2 is H or C1-C20 alkyl, C3-C7-heterocycle, silyl, C5-C20-aryl, C5-C20-arylsulphonyl or C1-C20-alkylsulphonyl; R3 is H or an O protection group; and X is oxygen, sulphur, nitrogen or phosphorus. The inventive method consists a) in transforming hydroxycarboxylic acid of formula (II), wherein R4 id H or C1-C6 alkyl provided with a link of the O protection group into a component of formula (III), wherein R3 is the O protection group; b) in reducing said acid into a compound of formula (IV) with alkali boron-or aluminium hydride; c) possibly activating and exchanging one oxygen atom against a radical containing one sulphur, nitrogen or phosphorus atom; or d) possibly transforming said acid with alkylation or arylation reagents into a compound of formula (V), wherein R′2 is possibly substituted C1-C20 alkyl-, C3-C7-heterocyclic-, silyl-, C5-C20-aryl-, C5-C20-arylsulphonyl or C1-C20- alkylsulphonyl and R3 is O protection group,