21089-13-4 Usage
General Description
(1-hydroxypropane-1,1-diyl)bis(phosphonic acid) is an organophosphorus compound with the chemical formula C3H11O7P2. It is commonly used as a corrosion inhibitor in various industrial processes, particularly in water treatment systems. The compound contains two phosphonic acid groups, which allows it to effectively bind to metal surfaces and provide protection against corrosion. It forms a protective layer on the metal surface, preventing the formation of rust and other types of corrosion. In addition to its corrosion inhibiting properties, (1-hydroxypropane-1,1-diyl)bis(phosphonic acid) also has chelating properties, making it useful in sequestering metal ions in water systems to prevent scale formation. Overall, it is a versatile and effective chemical for protecting metal surfaces and maintaining the integrity of water systems in various industrial applications.
Check Digit Verification of cas no
The CAS Registry Mumber 21089-13-4 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 2,1,0,8 and 9 respectively; the second part has 2 digits, 1 and 3 respectively.
Calculate Digit Verification of CAS Registry Number 21089-13:
(7*2)+(6*1)+(5*0)+(4*8)+(3*9)+(2*1)+(1*3)=84
84 % 10 = 4
So 21089-13-4 is a valid CAS Registry Number.
21089-13-4Relevant articles and documents
A study of the reaction of phosphorus trichloride with paraformaldehyde in the presence of carboxylic acids
Troev,Todorov,Naydenova,Mitova,Vassilev
, p. 1147 - 1155 (2013/09/23)
We investigated the mechanism of the reaction of paraformaldehyde with phosphorus trichloride in the presence of carboxylic acids (acetic, propanoic, and formic). Our results revealed that bisphosphonic acids were obtained without the use of water. The structures of the reaction products were studied by 1D and 2D homonuclear and heteronuclear 1H-, 13C-, 31P- NMR spectroscopy. [Supplementary materials are available for this article. Go to the publisher's online edition of Phosphorus, Sulfer, and Silicon and the Related Elements for the following free supplemental files: Additional tables.]
