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21319-43-7

21319-43-7

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21319-43-7 Usage

Chemical Properties

white powder

Check Digit Verification of cas no

The CAS Registry Mumber 21319-43-7 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 2,1,3,1 and 9 respectively; the second part has 2 digits, 4 and 3 respectively.
Calculate Digit Verification of CAS Registry Number 21319-43:
(7*2)+(6*1)+(5*3)+(4*1)+(3*9)+(2*4)+(1*3)=77
77 % 10 = 7
So 21319-43-7 is a valid CAS Registry Number.
InChI:InChI=1/2C11H20O2.Pb/c2*1-10(2,3)8(12)7-9(13)11(4,5)6;/h2*7,12H,1-6H3;/q;;+2/p-2/b2*8-7-;

21319-43-7 Well-known Company Product Price

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  • Alfa Aesar

  • (39397)  Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)lead(II)   

  • 21319-43-7

  • 1g

  • 309.0CNY

  • Detail

  • Alfa Aesar

  • (39397)  Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)lead(II)   

  • 21319-43-7

  • 5g

  • 1119.0CNY

  • Detail

  • Aldrich

  • (750662)  Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)lead(II)  97%

  • 21319-43-7

  • 750662-1G

  • 293.67CNY

  • Detail

  • Aldrich

  • (750662)  Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)lead(II)  97%

  • 21319-43-7

  • 750662-5G

  • 1,184.04CNY

  • Detail

21319-43-7SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 15, 2017

Revision Date: Aug 15, 2017

1.Identification

1.1 GHS Product identifier

Product name Lead bis(2,2,6,6-tetramethyl-3,5-heptanedionate)

1.2 Other means of identification

Product number -
Other names Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)lead(II)

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:21319-43-7 SDS

21319-43-7Downstream Products

21319-43-7Relevant articles and documents

Metal-organic chemical vapour deposition of lead scandium tantalate: Chemical issues and precursor selection

Jones,Leedham,Davies,Fleeting,O'Brien,Crosbie,Wright,Williams,Lane

, p. 351 - 355 (2000)

MOCVD is a promising technique for the deposition of the pyroelectric oxide lead scandium tantalate, Pb(Sc0.5Ta0.5)O3. In order to exploit the full potential of the method, it is important to identify the optimum combination of precursors so that process parameters and film properties are optimised. In this paper, issues involved in the selection of suitable Pb, Sc and Ta precursors are discussed and the molecular design of new Ta and Sc sources is described. It is shown how the use of carefully matched precursors allows the growth of Pb(Sc0.5Ta0.5)O3 in the required perovskite phase at low substrate temperatures. (C) 2000 Elsevier Science Ltd.

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