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22537-23-1

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22537-23-1 Usage

Check Digit Verification of cas no

The CAS Registry Mumber 22537-23-1 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 2,2,5,3 and 7 respectively; the second part has 2 digits, 2 and 3 respectively.
Calculate Digit Verification of CAS Registry Number 22537-23:
(7*2)+(6*2)+(5*5)+(4*3)+(3*7)+(2*2)+(1*3)=91
91 % 10 = 1
So 22537-23-1 is a valid CAS Registry Number.
InChI:InChI=1/Al/q+3

22537-23-1SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 20, 2017

Revision Date: Aug 20, 2017

1.Identification

1.1 GHS Product identifier

Product name aluminum(3+)

1.2 Other means of identification

Product number -
Other names Alumen

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:22537-23-1 SDS

22537-23-1Relevant articles and documents

Plasma chemistry fluctuations in a reactive arc plasma in the presence of magnetic fields

Rosen, Johanna,Anders, Andre,Schneider, Jochen M.

, p. 4109 - 4111 (2002)

The effect of a magnetic field on the plasma chemistry and pulse-to-pulse fluctuations of cathodic arc ion charge state distributions in a reactive environment were investigated. The plasma composition was measured by time-of-flight charge-to-mass spectrometry. The fluctuation of the concentrations of Al+, Al2+, and Al3+ was found to increase with an increasing magnetic field strength. We suggest that this is caused by magnetic field dependent fluctuations of the energy input into cathode spots as seen through fluctuations of the cathode potential. These results are qualitatively consistent with the model of partial local Saha equilibrium and are of fundamental importance for the evolution of the structure of films deposited by reactive cathodic arc deposition.

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