32046-62-1Relevant articles and documents
ULTRAVIOLET-STABILIZED CORROSION INHIBITORS
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Paragraph 0077, (2020/02/14)
According to one embodiment of the present disclosure, a method of forming an ultraviolet-stabilized corrosion inhibitor is provided. The method includes forming a functionalized azole; forming a functionalized photosensitizer; and forming an ultraviolet-stabilized corrosion inhibitor by reacting the functionalized azole with the functionalized photosensitizer. In another embodiment, an ultraviolet-stabilized corrosion inhibitor is provided. The inhibitor includes an azole bonded to a photosensitizer. In another embodiment, an article of manufacture is provided. The article of manufacture includes a material comprising a reaction product of an azole and a photosensitizer.
Does the partial molar volume of a solute reflect the free energy of hydrophobic solvation?
Szymaniec-Rutkowska, Anna,Bugajska, Ewa,Kasperowicz, S?awomir,Mieczkowska, Kinga,Maciejewska, Agnieszka M.,Poznański, Jaros?aw
, (2019/08/26)
Halogenated heterocyclic ligands are widely used as the potent and frequently selective inhibitors of protein kinases. However, the exact contribution of the hydrophobic solvation of a free ligand is rarely accounted for the balance of interactions contributing to the free energy of ligand binding. Herein, we propose a new experimental method based on volumetric data to estimate the hydrophobicity of a ligand. We have tested this approach for a series of ten variously halogenated benzotriazoles, the binding affinity of which to the target protein kinase CK2 was assessed with the use of thermal shift assay. According to the hierarchical clustering procedure, the excess volume, defined as the difference between the experimentally determined partial molar volume and the calculated in silico molecular volume, was found to be distant from any commonly used hydrophobicity descriptors of the ligand. The excess volume, however, properly predicts solute binding affinity. On the way, we have proved that the binding of halogenated benzotriazoles to the protein kinase CK2 is driven mostly by hydrophobic interactions.
CHEMICAL-MECHANICAL POLISHING COMPOSITION COMPRISING BENZOTRIAZOLE DERIVATIVES AS CORROSION INHIBITORS
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Paragraph 0267-0270, (2017/03/21)
A chemical-mechanical polishing (CMP) composition is provided comprising (A) one or more compounds selected from the group of benzotriazole derivatives which act as corrosion inhibitors and (B) inorganic particles, organic particles, or a composite or mixture thereof. The invention also relates to the use of certain compounds selected from the group of benzotriazole derivatives as corrosion inhibitors, especially for increasing the selectivity of a chemical mechanical polishing (CMP) composition for the removal of tantalum or tantalum nitride from a substrate for the manufacture of a semiconductor device in the presence of copper on said substrate.