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32046-62-1

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32046-62-1 Usage

General Description

5-Bromo-1H-benzotriazole is a chemical compound with the molecular formula C6H4BrN3. It is a white to off-white crystalline powder that is commonly used in organic synthesis as a reagent and intermediate. 5-Bromo-1H-benzotriazole is often utilized as a corrosion inhibitor for copper and copper alloys, and it is also used in the manufacture of pharmaceuticals, dyes, and pigments. Additionally, it is known to be a potential mutagen and may have harmful effects on aquatic organisms, so precautions should be taken when handling and disposing of this chemical.

Check Digit Verification of cas no

The CAS Registry Mumber 32046-62-1 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 3,2,0,4 and 6 respectively; the second part has 2 digits, 6 and 2 respectively.
Calculate Digit Verification of CAS Registry Number 32046-62:
(7*3)+(6*2)+(5*0)+(4*4)+(3*6)+(2*6)+(1*2)=81
81 % 10 = 1
So 32046-62-1 is a valid CAS Registry Number.
InChI:InChI=1/C6H4BrN3/c7-4-1-2-5-6(3-4)9-10-8-5/h1-3H,(H,8,9,10)

32046-62-1SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 17, 2017

Revision Date: Aug 17, 2017

1.Identification

1.1 GHS Product identifier

Product name 5-bromo-2H-benzotriazole

1.2 Other means of identification

Product number -
Other names 5-bromo-1H-1,2,3-benzotriazole

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:32046-62-1 SDS

32046-62-1Relevant articles and documents

ULTRAVIOLET-STABILIZED CORROSION INHIBITORS

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Paragraph 0077, (2020/02/14)

According to one embodiment of the present disclosure, a method of forming an ultraviolet-stabilized corrosion inhibitor is provided. The method includes forming a functionalized azole; forming a functionalized photosensitizer; and forming an ultraviolet-stabilized corrosion inhibitor by reacting the functionalized azole with the functionalized photosensitizer. In another embodiment, an ultraviolet-stabilized corrosion inhibitor is provided. The inhibitor includes an azole bonded to a photosensitizer. In another embodiment, an article of manufacture is provided. The article of manufacture includes a material comprising a reaction product of an azole and a photosensitizer.

Does the partial molar volume of a solute reflect the free energy of hydrophobic solvation?

Szymaniec-Rutkowska, Anna,Bugajska, Ewa,Kasperowicz, S?awomir,Mieczkowska, Kinga,Maciejewska, Agnieszka M.,Poznański, Jaros?aw

, (2019/08/26)

Halogenated heterocyclic ligands are widely used as the potent and frequently selective inhibitors of protein kinases. However, the exact contribution of the hydrophobic solvation of a free ligand is rarely accounted for the balance of interactions contributing to the free energy of ligand binding. Herein, we propose a new experimental method based on volumetric data to estimate the hydrophobicity of a ligand. We have tested this approach for a series of ten variously halogenated benzotriazoles, the binding affinity of which to the target protein kinase CK2 was assessed with the use of thermal shift assay. According to the hierarchical clustering procedure, the excess volume, defined as the difference between the experimentally determined partial molar volume and the calculated in silico molecular volume, was found to be distant from any commonly used hydrophobicity descriptors of the ligand. The excess volume, however, properly predicts solute binding affinity. On the way, we have proved that the binding of halogenated benzotriazoles to the protein kinase CK2 is driven mostly by hydrophobic interactions.

CHEMICAL-MECHANICAL POLISHING COMPOSITION COMPRISING BENZOTRIAZOLE DERIVATIVES AS CORROSION INHIBITORS

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Paragraph 0267-0270, (2017/03/21)

A chemical-mechanical polishing (CMP) composition is provided comprising (A) one or more compounds selected from the group of benzotriazole derivatives which act as corrosion inhibitors and (B) inorganic particles, organic particles, or a composite or mixture thereof. The invention also relates to the use of certain compounds selected from the group of benzotriazole derivatives as corrosion inhibitors, especially for increasing the selectivity of a chemical mechanical polishing (CMP) composition for the removal of tantalum or tantalum nitride from a substrate for the manufacture of a semiconductor device in the presence of copper on said substrate.

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