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329744-59-4

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329744-59-4 Usage

Check Digit Verification of cas no

The CAS Registry Mumber 329744-59-4 includes 9 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 6 digits, 3,2,9,7,4 and 4 respectively; the second part has 2 digits, 5 and 9 respectively.
Calculate Digit Verification of CAS Registry Number 329744-59:
(8*3)+(7*2)+(6*9)+(5*7)+(4*4)+(3*4)+(2*5)+(1*9)=174
174 % 10 = 4
So 329744-59-4 is a valid CAS Registry Number.

329744-59-4SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 19, 2017

Revision Date: Aug 19, 2017

1.Identification

1.1 GHS Product identifier

Product name 3-fluoro-4-(5-oxopenta-1,3-dienyl)benzonitrile

1.2 Other means of identification

Product number -
Other names -

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:329744-59-4 SDS

329744-59-4Relevant articles and documents

Mechanistic study of the oxidative degradation of the triazole antifungal agent CS-758 in an amorphous form

Ueyama, Eiji,Suzuki, Nobuyuki,Kano, Kenji

, p. 104 - 113 (2013/02/25)

In this study, the degradates generated from a pharmaceutical solid were characterized, and a mechanistic pathway underlying their formation was proposed. The chemical stability of a novel triazole antifungal drug, CS-758, deteriorated significantly when the crystal was disordered, and characteristic degradates were generated. A total of eight degradates in solution and nine degradates in a solid state were isolated by preparative liquid chromatography. Degradates were characterized using high-performance liquid chromatography-photodiode array, mass spectrometry, and nuclear magnetic resonance. Radical-mediated oxidation is proposed as the main degradation pathway in the solid state. The initiation step of this pathway is hydrogen atom abstraction from a methine carbon that is adjacent to a dien moiety and the formation of a delocalized vinylic radical intermediate. Molecular oxygen is then added to the radical position to form hydroperoxides. There are three potential oxidation routes based on the proposed autoxidation pathway that lead to the generation of the dioxane ring-opening hydroxyl form, the 9,10-epoxide form, or the 11,12-epoxide form, depending on the substituted position of the added molecular oxygen. The epimer compound generated via the vinylic radical intermediate and sulfoxides was characterized. This degradation mechanism provides the scientific foundation for an oxidative stressing system currently under investigation.

Synthesis and in vitro antifungal activities of novel triazole antifungal agent CS-758

Konosu, Toshiyuki,Oida, Sadao,Nakamura, Yoshie,Seki, Shinobu,Uchida, Takuya,Somada, Atsushi,Mori, Makoto,Harada, Yoshiko,Kamai, Yasuki,Harasaki, Tamako,Fukuoka, Takashi,Ohya, Satoshi,Yasuda, Hiroshi,Shibayama, Takahiro,Inoue, Shin-Ichi,Nakagawa, Akihiko,Seta, Yasuo

, p. 1647 - 1650 (2007/10/03)

Synthesis and in vitro antifungal activities of a novel triazole antifungal agent CS-758 (former name, R120758) are described. The minimum inhibitory concentrations (MICs) of a series of dioxane-triazole compounds related to R-102557 were examined. Variat

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