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33559-14-7

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33559-14-7 Usage

Check Digit Verification of cas no

The CAS Registry Mumber 33559-14-7 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 3,3,5,5 and 9 respectively; the second part has 2 digits, 1 and 4 respectively.
Calculate Digit Verification of CAS Registry Number 33559-14:
(7*3)+(6*3)+(5*5)+(4*5)+(3*9)+(2*1)+(1*4)=117
117 % 10 = 7
So 33559-14-7 is a valid CAS Registry Number.

33559-14-7SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 18, 2017

Revision Date: Aug 18, 2017

1.Identification

1.1 GHS Product identifier

Product name 1-Chlor-1-phenyl-1,2,2,2-tetramethyldisilan

1.2 Other means of identification

Product number -
Other names 1-Chlor-1-phenyltetrametyldisilan

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:33559-14-7 SDS

33559-14-7Relevant articles and documents

Oxidation of Triorganosilanes and Related Compounds by Chlorine Dioxide

Grabovskiy,Kabal’nova

, p. 2391 - 2402 (2022/01/22)

Abstract: Oxidation of triethylsilane, tert-butyldimethylsilane, dimethylphenylsilane, triphenylsilane, 1,1,1,2tetramethyl-2-phenyldisilane, tris(trimethylsilyl)silane, hexamethyldisilane, tetrakis(trimethylsilyl)silane, 1,1,3,3tetraisopropyldisiloxane with chlorine dioxide was carried out. The reaction products of studied triorganosilanes with chlorine dioxide in an acetonitrile solution were the corresponding silanols and siloxanes. A mechanism explaining the formation of products and the observed regularities of the oxidation of silanes with chlorine dioxide has been proposed. A thermochemical analysis of some possible pathways in the gas phase using methods G4, G3, M05, and in an acetonitrile solution by the SMD-M05 method was carried out. The oxidation process can occur both with the participation of ionic and radical intermediates, depending on the structure of the oxidized substrate and medium.

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