33693-84-4

Basic information

• Product Name: TERT-BUTYL HYDROGEN PHTHALATE
• Synonyms: 2-(TERT-BUTOXYCARBONYL)BENZOIC ACID;TERT-BUTYL HYDROGEN PHTHALATE;TIMTEC-BB SBB007635;Phthalic acid mono-tert-butyl ester
• CAS NO: 33693-84-4
• Molecular Formula: C₁₂H₁₄O₄
• Molecular Weight: 222.24
• Mol File: 33693-84-4.mol
• Article Data: 3

Chemical Properties

• Melting Point: 79-80°C
• Boiling Point: 349.8°Cat760mmHg
• Flash Point: 131.8°C
• Appearance: /
• Density: 1.173g/cm³
• Vapor Pressure: 1.72E-05mmHg at 25°C
• Water Solubility: Insoluble in water.
• BRN: 2263386
• CAS DataBase Reference: TERT-BUTYL HYDROGEN PHTHALATE(CAS DataBase Reference)
• NIST Chemistry Reference: TERT-BUTYL HYDROGEN PHTHALATE(33693-84-4)
• EPA Substance Registry System: TERT-BUTYL HYDROGEN PHTHALATE(33693-84-4)

Safety Data

• Statements: 36/37/38
• Safety Statements: 26-36
• Hazardous Substances Data: 33693-84-4(Hazardous Substances Data)

Usage

Description

TERT-BUTYL HYDROGEN PHTHALATE is an organic compound commonly utilized in various industrial applications due to its unique properties. It is known for its ability to facilitate specific chemical reactions and resolutions, making it a valuable component in the synthesis of certain compounds.

Uses

Used in Pharmaceutical Industry:
TERT-BUTYL HYDROGEN PHTHALATE is used as a resolving agent for the separation of enantiomers, specifically in the production of pharmaceuticals. Its ability to selectively interact with specific molecular structures allows for the efficient resolution of chiral compounds, which is crucial in the development of single-enantiomer drugs.
Used in Chemical Synthesis:
TERT-BUTYL HYDROGEN PHTHALATE is used as a reagent in the synthesis of various organic compounds. Its unique properties enable it to participate in specific reactions, such as the resolution of tertiary alcohols like 2-phenylbutan-2-ol and 3-methylhexan-3-ol, which are important intermediates in the production of pharmaceuticals and other specialty chemicals.

Synthesis Reference(s)

The Journal of Organic Chemistry, 28, p. 582, 1963 DOI: 10.1021/jo01037a515

InChI:InChI=1/C12H14O4/c1-12(2,3)16-11(15)9-7-5-4-6-8(9)10(13)14/h4-7H,1-3H3,(H,13,14)/p-1

Upstream product

• 85-44-9 phthalic anhydride 
• 75-65-0 tert-butyl alcohol 
• 75-91-2 tert.-butylhydroperoxide 
• 6383-11-5 benzocyclobutene-1,2-dione 
• 182342-95-6 Phthalic acid 1-tert-butyl ester 2-prop-2-ynyl ester 
• 123-91-1 1,4-dioxane 

Downstream Products

• 87483-07-6 N-glycine 
• 182342-95-6 Phthalic acid 1-tert-butyl ester 2-prop-2-ynyl ester 
• 87483-10-1 (Z)-2-(o-Carboxyphenyl)-4-(3,4-diacetoxybenzylidene)-5-oxazolone 
• 87483-15-6 2--4-<1-(3,4-diacetoxyphenyl)ethylidene>-5-oxazolone 
• 87483-14-5 1-(3,4-Diacetoxyphenyl)-7--8-oxa-3,4,6-triazaspiro<4.4>nona-3,6-dien-9-one 
• 1000865-62-2 N-(1-cyclohexyl-5-ethyl-hexahydro-2,4,6-trioxo-5-pyrimidinyl)phthalamic acid tert-butyl ester 
• 774-65-2 benzoic acid tert-butyl ester 

Relevant articles and documents

Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method for manufacturing photosensitive dry film, method for manufacturing patterned resist film, method for manufacturing substrate with mold comprising a nitrogen-containing heterocyclic compound (C), an acid generator (A) and a resin (B)

The present invention relates to a chemically amplified positive-type photosensitive resin composition that easily forms a resist pattern having a rectangular cross-sectional shape, a photosensitive dry film including a photosensitive resin layer formed by using the chemically amplified positive-type photosensitive resin composition, a method for manufacturing the photosensitive dry film, a method for manufacturing a patterned resist film using the aforementioned chemically amplified positive-type photosensitive resin composition, a method for manufacturing a substrate with a mold using the aforementioned chemically amplified positive-type photosensitive resin composition, a method for manufacturing a plated product using the substrate with a mold, and a novel nitrogen-containing heterocyclic compound. The solution of the present invention is a chemically amplified positive-type photosensitive resin composition which comprises: a nitrogen-containing heterocyclic compound (C) which is a nitrogen-containing heterocyclic compound having a specific structure and a LogS value of -4.00 or less; wherein the chemically amplified positive-type photosensitive resin composition comprises an acid generator (A) that generates acid by irradiation with actinic rays or radiation; and a resin (B) the solubility of which in alkali is increased by the action of an acid.

Chemilumineszenz- und Oxidationsreactionen von Phthaloylperoxid und verwandten Verbindungen.

Phthaloylperoxid (PPO) und 4,5-Dichlorphthaloylperoxid ergeben mit fluoreszenzfaehigen aromatischen Kohlenwasserstoffen wie 9,10-Diphenylanthracen (DPA), 9,10-Bis(phenylethinyl)anthracen, Pyren, Perylen, aber auch heterocyclischen Verbindungen wie 1,3-Diphenylbenzofuran (9), Luminol oder Fluorescein Chemilumineszenz, die Quantenausbeuten bis 1E-3 Einstein/mol erreichen kann, wenn Phthalsaeureester als Loesungsmittel eingesetzt werden.Die Chemilumineszenz wird durch Sauerstoff hinsichtlich der Maximalintensitaet gesteigert, hinsichtlich der Lichtausbeute auf etwa 80percent verringert.Da bei Derivaten des 1,3-Diphenyl-benzofurans sowohl Chemilumineszenz, als auch Bildung der entsprechenden "Photooxdationsprodukte" (bei 9: o-Dibenzoylbenzol) beobachtet wurde, wird die Moeglichkeit der Bildung von Singulett-Sauerstoff aus PPO diskutiert.Die Bildung von Phthalsaeure-halbestern aus PPO und Olefinen anstelle des Auftretens von Hydroperoxiden wird ueber die thermodynamisch moegliche intermediaere Bildung von Benzocyclobutendion erklaert und ist kein grundsaetzlicher Widerspruch gegen das Auftreten von Singulett-Sauerstoff bei PPO-Reaktionen.