34844-48-9Relevant articles and documents
Facile preparation and synthetic applications of LiCH2C(CF3)2Oli
Grushin, Vladimir V.,Marshall, William J.,Halliday, Gary A.,Davidson, Fredric,Petrov, Viacheslav A.
, p. 121 - 129 (2002)
Bromohydrin BrCH2C(CF3)2OH readily reacts with two equivalents of n-BuLi at - 78 °C to produce the corresponding dilithium derivative LiCH2C(CF3)2OLi in high yield. This dilithiated derivative reacts selectively, acting as a C-nucleophile, with a variety of electrophiles such as R2PCl, carbonyl compounds, and epoxides, to give electron-deficient phosphines R2PCH2C(CF3)2OH, 1,3- and 1,4-diols, correspondingly.
1,1-Bis(trifluoromethyl)butadiene-1,3-A new fluorinated building block
Petrov, Viacheslav A.
, p. 529 - 538 (2008/09/17)
Although 1,1-bis(trifluoromethyl)butadiene-1,3 (1) reacts with dimethylamine with selective formation of 1,4-adduct [trans-(CF3)2CHCH{double bond, long}CHCH2N(CH3)2], halogenation of 1 proceeds with predominant formation (>92%) of 1,2-adducts (CF3)2C{double bond, long}CHCHXCH2X (X = Cl or Br). Electrophilic conjugated addition of "ClF" or "BrF" to 1 proceeds exclusively with the formation of 1,2-adducts (CF3)2C{double bond, long}CHCHFCH2X (major) and (CF3)2C{double bond, long}CHCHXCH2F (X = Cl or Br). Difluorocarbene adds selectively to {single bond}CH{double bond, long}CH2 moiety of 1 forming thermally stable vinylcyclopropane. In Diels-Alder reaction with linear or cyclic dienes (butadienes, cyclopentadiene, cyclohexadiene-1,3) and quadricyclane compound 1 behaves as dienophile providing for the reaction electron-deficient {single bond}CH{double bond, long}CH2 bond. The relative rate of cycloaddition of 1 and other fluoroolefins to quadricyclane, measured by high temperature NMR, indicates that (CF3)2C{double bond, long}CH{single bond} acts as very strong electron-withdrawing substituent. Synthetic utility of products based on 1 was also demonstrated.
Fluorinated vinyl ethers, copolymers thereof, and use in lithographic photoresist compositions
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Page/Page column 12-13, (2008/06/13)
Fluorinated vinyl ethers are provided having the structure of formula (I) the structure of formula (I) wherein at least one of X and Y is a fluorine atom, and L, R1, R2, R3, R4 are as defined herein. Also provided are copolymers prepared by radical polymerization of (I) and a second monomer that may not be fluorinated. The polymers are useful in lithographic photoresist compositions, particularly chemical amplification resists. In a preferred embodiment, the polymers are substantially transparent to deep ultraviolet (DUV) radiation, and are thus useful in DUV lithographic photoresist compositions. A method for using the composition to generate resist images on a substrate is also provided, i.e., in the manufacture of integrated circuits or the like.