378215-21-5

Basic information

• Product Name: Ethanone, 2-(benzoyloxy)-1-(2,5-dimethylphenyl)-
• CAS NO: 378215-21-5
• Molecular Formula: C17H16O3
• Molecular Weight: 268.312
• Mol File: 378215-21-5.mol
• Article Data: 3

Chemical Properties

• CAS DataBase Reference: Ethanone, 2-(benzoyloxy)-1-(2,5-dimethylphenyl)-(CAS DataBase Reference)
• NIST Chemistry Reference: Ethanone, 2-(benzoyloxy)-1-(2,5-dimethylphenyl)-(378215-21-5)
• EPA Substance Registry System: Ethanone, 2-(benzoyloxy)-1-(2,5-dimethylphenyl)-(378215-21-5)

Safety Data

• Hazardous Substances Data: 378215-21-5(Hazardous Substances Data)

Upstream product

• 532-32-1 sodium benzoate 
• 50690-11-4 2,5-dimethylphenacyl chloride 
• 65-85-0 benzoic acid 

Downstream Products

• 532-32-1 sodium benzoate 
• 2142-73-6 1-(2,5-dimethylphenyl)-1-ethanone 
• 24623-20-9 2,3-dihydro-6-methyl-1H-inden-1-one 
• 66521-22-0 2-(methoxymethyl)-5-methylacetophenone 
• 65-85-0 benzoic acid 

Relevant articles and documents

Photolysis of phenacyl esters in a two-phase system

Phenacyl esters are useful photoremovable protecting groups for carboxylic acids in organic synthesis and biochemistry. In this work, simple one-pot arrangements of the phenacyl and 2,5-dimethylphenacyl ester photolysis are proposed. The reactions were performed in both the benzene/water two-phase system and in water. Cetyltrimethylammonium bromide was found to increase substantially the efficiency of the deprotection as well as the purity of the products by lowering the interfacial tension between the phases. Utilizing water as a medium significantly reduced the necessity to use environmentally malign organic solvents. The overall yields varied from 72 to 98% depending on the reaction conditions.

2,5-Dimethylphenacyl as a New Photoreleasable Protecting Group for Carboxylic Acids

(Matrix Presented) The 2,5-dimethylphenacyl chromophore, a new photoremovable protecting group for carboxylic acids, is proposed. Direct photolysis of various 2,5-dimethylphenacyl esters in benzene or methanol at 254-366 nm leads to the formation of the corresponding carboxylic acids in almost quantitative isolated yields. The photodeprotection is based on efficient intramolecular hydrogen abstraction without the necessity of introducing a photosensitizer.