40538-81-6Relevant articles and documents
N-lithio-N,N',N'',N''-tetramethyldiethylenetriamine and N'-lithio- N,N,N'',N''-tetramethyldiethylenetriamine; oxidative coupling of aminomethyllithium derivatives
Luitjes,Schakel,Klumpp
, p. 2257 - 2261 (1994)
N-lithio-N,N',N'',N''-tetramethyldiethylenetriamine (I-Li) is formed from 2,5,8,11-tetramethyl-2,5,8,11-tetraazadodecane (III) or from 2,5,8,11,14,17- hexamethyl-2,5,8,11,14,17-hexaazaoctadecane (IV) with n-BuLi or sec-BuLi, respectively, its isomer N'-lithio-N,N,N'',N'',-tetramethyldiethylene- triamine (II-Li) from tris(2-dimethylaminoethyl)amine (V) with n-BuLi. IV results from treatment of N-lithiomethyl-N,N',N'',N''- tetramethyldiethylenetriamine (PMDTA-Li) with 1,2-dibromoethane.
Near infrared ray absorbent composition, near infrared ray cut filter, solid image pickup element, and camera module
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Page/Page column 142; 143, (2019/03/11)
Provided are a near infrared ray absorbent composition which can form a cured film having excellent near infrared ray shielding properties, a near infrared ray cut filter, a manufacturing method of a near infrared ray cut filter, a solid image pickup element, and a camera module. The near infrared ray absorbent composition includes a copper complex that is other than a copper phthalocyanine complex and has a maximum absorption wavelength in a wavelength range of 700 to 1,200 nm and in which a molar light absorption coefficient at the maximum absorption wavelength is greater than or equal to 100 (L/mol·cm).
TETRACYCLIC ANTHRAQUINONE DERIVATIVES
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Paragraph 0113, (2015/02/02)
Disclosed are a compound represented by formula (I) and a pharmaceutically acceptable salt thereof, wherein R1, R2, R3, R4, R5, W, n are defined as in the present application.
Modification and optimization of the bis-picolylamide-based relay protection for carboxylic acids to be cleaved by unusual complexation with Cu2+ salts
Mundinger, Stephan,Jakob, Uwe,Bichovski, Plamen,Bannwarth, Willi
, p. 8968 - 8979,12 (2012/12/11)
A simple modification of our recently published protection scheme for carboxylic acids as amides resulted in a new protecting group with significantly improved properties. It requires shorter reaction times for deprotection and allows us to replace Cu(OTf)2 by CuCl2, indicating at the same time the importance of the nature of the anion of the Cu2+ source. Since the new scheme fulfills all criteria required for an ideal protection group it should find widespread application in synthetic organic chemistry.