53744-42-6

Basic information

• Product Name: BUFFER SOLUTION
• Synonyms: 1,10-Phenanthroline,4,7-di(phenylsulfonicacid)-,disodiumsalt;4,4’-(1,10-phenanthroline-4,7-diyl)bis-benzenesulfonicacidisodiumsalt;4,7-di(4-Phenylsulfonicacid)-1,10-phenanthroline,disodiumsalt;Benzenesulfonicacid,4,4’-(1,10-phenanthroline-4,7-diyl)bis-,disodiumsalt;BATHOPHENANTHROLINEDISULFONIC ACID, DISODIUM SALT HYDRATE;BATHOPHENANTHROLINE DISULFONIC ACID NA2-SALT H20;BLUE-TEN(TM) BUFFER, PH 10.00;BLUE HIGH-ACCURACY BUFFER, PH 10.000
• CAS NO: 53744-42-6
• Molecular Formula: C₂₄H₁₄N₂O₆S₂*H₂O*2Na
• Molecular Weight: 590.53
• EINECS: 258-152-0
• Product Categories: Buffer Solutions, pH 5 - 9Biological Buffers;Phosphate Buffer Solutions;Buffer SolutionspH Buffers for Titration;Buffers A to ZpH Buffers for Titration;Buffer Concentrates (FIXANAL);Titration;Buffer Solutions, pH 10 - 13;Buffer Solutions;pH Buffers for Titration;Biological Buffers;Buffer Convenience Packaging;Buffer SolutionsBiological Buffers;Buffers A to Z;Buffer Solutions, pH 5 - 9pH Buffers for Titration
• Mol File: 53744-42-6.mol
• Article Data: 0

Chemical Properties

• Melting Point: 300 °C
• Boiling Point: °Cat760mmHg
• Flash Point: °C
• Appearance: No Color/Liquid
• Density: 1.006 g/mL at 20 °C
• Vapor Density: 4.9 (vs air)
• Storage Temp.: 2-8°C
• Solubility: H2O: soluble
• CAS DataBase Reference: BUFFER SOLUTION(CAS DataBase Reference)
• NIST Chemistry Reference: BUFFER SOLUTION(53744-42-6)
• EPA Substance Registry System: BUFFER SOLUTION(53744-42-6)

Safety Data

• Hazard Codes: Xi,C
• Statements: 36/38-36/37/38-36-52/53-35-67
• Safety Statements: 26-36-24/25-37/39-61-45-36/37/39
• RIDADR: UN2817
• WGK Germany: 3
• F: 8-10
• HazardClass: 8
• PackingGroup: III
• Hazardous Substances Data: 53744-42-6(Hazardous Substances Data)

Usage

Description

BUFFER SOLUTION is an improved HF Buffer System with stabilized HF activity, specifically designed as a selective solvent for SiO2 used in semiconductor technology. It is utilized in the manufacturing of planar passivated devices such as transistors, integrated circuits, diodes, rectifiers, SCR, MOS, and FET.

Uses

Used in Semiconductor Technology:
BUFFER SOLUTION is used as a selective solvent for SiO2, which is essential in the manufacturing of various semiconductor devices. It is particularly effective in the pretreatment of planar silicon devices when plating with Nickel plating solution products 44069 and 44070.
Used in Silicon Device Manufacturing:
BUFFER SOLUTION is used for dissolving silica films (both thermally grown and silane SiO2) produced on the surfaces of silicon and exposed by photolithography. It is also capable of dissolving doped silica films such as phosphosilica and borosilica glasses as formed in semiconductor processing. The overall chemical reaction is: 4HF + SiO2 → SiF4 + 2H2O.
Used in New Technologies for Semiconductor Planar and Mesa Devices:
BUFFER SOLUTION is recommended for trouble-free operation in the new technologies for the manufacture of semiconductor planar and mesa devices. It is compatible with both negative and positive photoresists, providing excellent results with good reproducibility. It ensures no undercutting of marked oxides, no surface staining, and avoids device degradation by metallic impurities.
Advantages:
BUFFER SOLUTION offers several advantages, including being ready-to-use and economical. It has excellent process reproducibility and does not undercut masked oxide. It will not stain diffused silicon surfaces and avoids contamination on silicon surfaces. The photoresist coating remains unaffected. The HF activity buffer is stabilized, and the composition is precisely controlled by HF activity measurements and electrometric pH. The mass balance corresponds essentially to (HF) + (F) + 2(HF2) for a two-ligand mononuclear complex, and the charge balance is (H+) (F) + (HF2-). The HF activity is maintained constant through the specific equilibrium constant which regulates the equilibrium reaction between fluoride, bifluoride, and HF buffer components. A second equilibrium constant participates in the regulation of the hydronium in concentration of pH. BUFFER HF improved is produced and analyzed to be essentially free of impurities, with nitrate ions and heavy metal impurities specifically removed or controlled under manufacturing process specifications.