5466-89-7Relevant articles and documents
FLUORINE-CONTAINING COMPOUND, SUBSTRATE FOR PATTERN FORMATION, PHOTODEGRADABLE COUPLING AGENT, PATTERN FORMATION METHOD, AND COMPOUND
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, (2017/06/27)
A compound represented by formula (e): where R1 represents a branched chain or cyclic alkyl group having 3 to 10 carbon atoms, and Rf1 and Rf2 represent fluorinated alkoxy groups.
Surface control of a photoresponsive self-assembled monolayer and selective deposition of Ag Nanoparticulate Ink
Konishi, Tsubasa,Yamaguchi, Kazuo
, p. 424 - 429 (2016/04/26)
A highly hydrophobic self-assembled monolayer (SAM) with high photosensitivity to soft UV (λ = 365 nm) was formed on thermally surface-oxidized silicon wafers by a silane coupling agent bearing a 2-nitrobenzyl carbamate moiety. Very smooth SAM was obtaine