5495-80-7

Basic information

• Product Name: Benzoic acid, 2-[[4-(1,1-dimethylethyl)phenyl]thio]-
• CAS NO: 5495-80-7
• Molecular Formula: C17H18O2S
• Molecular Weight: 286.395
• Mol File: 5495-80-7.mol
• Article Data: 3

Chemical Properties

• CAS DataBase Reference: Benzoic acid, 2-[[4-(1,1-dimethylethyl)phenyl]thio]-(CAS DataBase Reference)
• NIST Chemistry Reference: Benzoic acid, 2-[[4-(1,1-dimethylethyl)phenyl]thio]-(5495-80-7)
• EPA Substance Registry System: Benzoic acid, 2-[[4-(1,1-dimethylethyl)phenyl]thio]-(5495-80-7)

Safety Data

• Hazardous Substances Data: 5495-80-7(Hazardous Substances Data)

Upstream product

• 17333-86-7 o-Carboxybenzenediazonium 
• 2396-68-1 4-t-butylbenzenethiol 
• 88-67-5 2-Iodobenzoic acid 
• 15084-51-2 4-tert-butylbenzenesulfonyl chloride 
• 35779-04-5 1-tert-butyl-4-iodobenzene 
• 147-93-3 Thiosalicylic acid 

Downstream Products

• 16174-84-8 [2-(4-tert-Butyl-phenylsulfanyl)-phenyl]-acetic acid 
• 16174-83-7 [2-(4-tert-Butyl-phenylsulfanyl)-phenyl]-acetonitrile 
• 16174-82-6 C₁₇H₁₉ClS 
• 19711-56-9 C₁₇H₂₀S 
• 16174-81-5 2-<4-tert.-Butylphenylthio>-benzylalkohol 
• 101595-56-6 2-(4-tert-butyl-benzenesulfonyl)-benzoic acid 

Relevant articles and documents

Positive resist composition, resist pattern forming process, and photomask blank

A positive resist composition comprising a polymer adapted to be decomposed under the action of acid to increase its solubility in alkaline developer and a sulfonium compound of specific structure has a high resolution. When the resist composition is processed by lithography, a pattern with minimal LER can be formed.

NOVEL SULPHONIUM COMPOUND AND METHOD FOR PRODUCING THE SAME, RESIST COMPOSITION, AND PATTERN FORMING METHOD

PROBLEM TO BE SOLVED: To provide a resist composition that gives a resist film excellent in resolution, LWR, MEF and CDU, in far-ultraviolet lithography and EUV lithography, and provide a sulphonium compound for use therein, and provide a pattern forming method using the resist composition. SOLUTION: The present invention provides a sulphonium compound represented by the following formula (1) (where R1, R2 and R3 independently represent a C1-20 linear, branched or cyclic monovalent hydrocarbon group, which may contain a hetero atom. p and q independently represent an integer of 0-5. r is an integer of 0-4). SELECTED DRAWING: None COPYRIGHT: (C)2018,JPOandINPIT