Welcome to LookChem.com Sign In|Join Free

CAS

  • or

55544-30-4

Post Buying Request

55544-30-4 Suppliers

Recommended suppliersmore

  • Product
  • FOB Price
  • Min.Order
  • Supply Ability
  • Supplier
  • Contact Supplier

55544-30-4 Usage

Check Digit Verification of cas no

The CAS Registry Mumber 55544-30-4 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 5,5,5,4 and 4 respectively; the second part has 2 digits, 3 and 0 respectively.
Calculate Digit Verification of CAS Registry Number 55544-30:
(7*5)+(6*5)+(5*5)+(4*4)+(3*4)+(2*3)+(1*0)=124
124 % 10 = 4
So 55544-30-4 is a valid CAS Registry Number.

55544-30-4SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 15, 2017

Revision Date: Aug 15, 2017

1.Identification

1.1 GHS Product identifier

Product name poly(methylsilane)

1.2 Other means of identification

Product number -
Other names polymethylsilane

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:55544-30-4 SDS

55544-30-4Downstream Products

55544-30-4Relevant articles and documents

Ultraviolet photolysis of 1,2-Dimethyldisilane in the gas phase

Al-Rubaiey, Najem

, p. 145 - 151 (2018)

The formation of MeSiH is the primary process in the photolysis of 1,2-dimethyldisilane at 193 nm that are analogues of carbenes. Gas chromatographic technique was used with a flame ionization detector as an analysis tool to identify the products mixture. The photolysis light at 193 nm was provided by an Oxford KX2 pulsed laser operated with rare-gas halide (known as an excimer laser) as the gain medium to provide ultraviolet (UV) radiation. This work has confirmed that radical processes are not important in the photolysis of 1,2-dimethyldisilane. A method for the determination of rate constants for MeSiH reactions relative to the rate constants of 1,2-dimethyldisilane has been formulated. This has been used to determine some relative rate constants of MeSiH insertions with methylsilanes. The insertion reactions of MeSiH with SiH4 and Methysilanes have shown to be fast and closer in reactivity to SiH2 than to SiMe2, whereas PhSiH looks to be slightly more reactive than MeSiH.

Hetero-?-Systems, 8. Silaethene

Maier, Guenther,Mihm, Gerhard,Reisenauer, Hans Peter

, p. 2351 - 2368 (2007/10/02)

By means of a combination of vacuum flash pyrolysis and matrix isolation silaethene (1a) and its simply substituted derivatives 1b-f can be prepared starting with precursors 9a-f of the silabicyclooctadiene type.Silaolefins 1a-f are stable in argon at 10 K and can be identified by their characteristic IR and UV spectra.

Reversible Photoisomerisierung zwischen Silaethenen und Methylsilylenen (Methylsilandiylen)

Reisenauer, Hans Peter,Mihm, Gerhard,Maier, Guenther

, p. 864 - 865 (2007/10/02)

-

Post a RFQ

Enter 15 to 2000 letters.Word count: 0 letters

Attach files(File Format: Jpeg, Jpg, Gif, Png, PDF, PPT, Zip, Rar,Word or Excel Maximum File Size: 3MB)

1

What can I do for you?
Get Best Price

Get Best Price for 55544-30-4