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59780-98-2

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59780-98-2 Usage

Type of compound

Chemical compound

Structure

Cyclic compound containing sulfur and oxygen atoms

Usage

Intermediate in the synthesis of other organic compounds

Industries

Pharmaceutical and agrochemical industries

Physical state

Colorless to pale yellow liquid at room temperature

Solubility

Slightly soluble in water, soluble in organic solvents

Safety precautions

Harmful if ingested, inhaled, or in contact with skin and eyes

Check Digit Verification of cas no

The CAS Registry Mumber 59780-98-2 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 5,9,7,8 and 0 respectively; the second part has 2 digits, 9 and 8 respectively.
Calculate Digit Verification of CAS Registry Number 59780-98:
(7*5)+(6*9)+(5*7)+(4*8)+(3*0)+(2*9)+(1*8)=182
182 % 10 = 2
So 59780-98-2 is a valid CAS Registry Number.

59780-98-2SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 16, 2017

Revision Date: Aug 16, 2017

1.Identification

1.1 GHS Product identifier

Product name 1,4-dithiaspiro[4.5]decan-6-ol

1.2 Other means of identification

Product number -
Other names 6-hydroxy-1,4-dithiaspiro<2-hydroxy-1,1-(1,2-ethanedithio)cyclohexane

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:59780-98-2 SDS

59780-98-2Relevant articles and documents

Acid-amplifier having acetal group and photoresist composition including the same

-

Page/Page column 8, (2009/02/10)

An acid-amplifier having an acetal group and a photoresist composition including the same, are disclosed. The acid-amplifier produces an acid (second acid) during a post-exposure-bake (PEB), which is induced by an acid (first acid) generated from a photo-acid generator (PAG) at the exposure process so that a line edge roughness (LER) of the photoresist pattern and photoresist energy sensitivity are improved. The acid-amplifier has a structure of following Formula 1. in Formula 1, R is C4~C20 mono-cyclic or multi-cyclic saturated hydrocarbon, R1 is C1~C10 linear hydrocarbon, C1~C10 perfluoro compound or C5~C20 aromatic compound, Ra and Rb are independently hydrogen atom or C1~C4 saturated hydrocarbon and A is independently oxygen atom (O) or sulfur atom (S).

The substrate- and stereoselectivity of microbial reductions of 1,4-dithiaspirodecanones and 1,5-dithiaspiroundecanones

Takemura, Tetsuo,Hosoya, Yoshiko,Mori, Nobuo

, p. 523 - 529 (2007/10/02)

The title spirocyclic ketones, possessing possible substitution patterns 1,4-dithiaspirodecan-6-one (1a), -7-one (3a), and -8-one (5a) and 1,5-dithiaspiroundecan-7-one (2a), -8-one (4a), and -9-one (6a), have been reduced with new strains of yeast (Saccharomyces cerevisiae, JCM 1819 and JCM 2214).Reductions of the prochiral ketones 1a-4a occur with high enantiofacial selectivity on the preparative scale (up to 99percent ee).The product alcohols (1,4-dithiaspirodecan-6-ol (1b) and -7-ol (3b) and 1,5-dithiaspiroundecan-7-ol (2b) and -8-ol (4b)) have theS configuration, as confirmed by 2D COSY experiments of the (S)-MTPA ester of 1b-4b using the configuration correlation model of Mosher.

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