59780-98-2Relevant articles and documents
Acid-amplifier having acetal group and photoresist composition including the same
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Page/Page column 8, (2009/02/10)
An acid-amplifier having an acetal group and a photoresist composition including the same, are disclosed. The acid-amplifier produces an acid (second acid) during a post-exposure-bake (PEB), which is induced by an acid (first acid) generated from a photo-acid generator (PAG) at the exposure process so that a line edge roughness (LER) of the photoresist pattern and photoresist energy sensitivity are improved. The acid-amplifier has a structure of following Formula 1. in Formula 1, R is C4~C20 mono-cyclic or multi-cyclic saturated hydrocarbon, R1 is C1~C10 linear hydrocarbon, C1~C10 perfluoro compound or C5~C20 aromatic compound, Ra and Rb are independently hydrogen atom or C1~C4 saturated hydrocarbon and A is independently oxygen atom (O) or sulfur atom (S).
The substrate- and stereoselectivity of microbial reductions of 1,4-dithiaspirodecanones and 1,5-dithiaspiroundecanones
Takemura, Tetsuo,Hosoya, Yoshiko,Mori, Nobuo
, p. 523 - 529 (2007/10/02)
The title spirocyclic ketones, possessing possible substitution patterns 1,4-dithiaspirodecan-6-one (1a), -7-one (3a), and -8-one (5a) and 1,5-dithiaspiroundecan-7-one (2a), -8-one (4a), and -9-one (6a), have been reduced with new strains of yeast (Saccharomyces cerevisiae, JCM 1819 and JCM 2214).Reductions of the prochiral ketones 1a-4a occur with high enantiofacial selectivity on the preparative scale (up to 99percent ee).The product alcohols (1,4-dithiaspirodecan-6-ol (1b) and -7-ol (3b) and 1,5-dithiaspiroundecan-7-ol (2b) and -8-ol (4b)) have theS configuration, as confirmed by 2D COSY experiments of the (S)-MTPA ester of 1b-4b using the configuration correlation model of Mosher.