636597-02-9Relevant articles and documents
Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds
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Page 16, (2010/02/03)
The present invention relates to a novel photoresist composition that can be developed with an aqueous alkaline solution, and is capable of being imaged at exposure wavelengths in the deep ultraviolet. The invention also relates to a process for imaging the novel photoresist as well as novel photoacid generators.