669768-29-0Relevant articles and documents
Salt and resist compsn.
-
Paragraph 0169, (2016/10/17)
PURPOSE: Salts are provided to enable use as a photoacid generator and to obtain photoresist patterns with excellent shape and line edge roughness. CONSTITUTION: Salts are represented by chemical formula I. In chemical formula I, Q^1 and Q^2 are independently fluorine atom or C1-6 perfluoroalkyl group; L^1 is a single bond or substituted or unsubstituted divalent C1-17 saturated hydrocarbon; Y^1 is (m+1)-valent C3-18 saturated cyclic hydrocarbon, wherein at least one -CH2- included in the saturated cyclic hydrocarbon group may be substituted with -O-, -CO- or SO2-; X^1 is C1-12 aliphatic hydrocarbon radical having at least one fluorine element; m is 1 or 2; and Z^+ is organic counter ions.
