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71255-78-2

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71255-78-2 Usage

General Description

The chemical 2-(3,4-methylenedioxyphenyl)-4,6-bis(trichloromethyl)-1,3,5-triazine is a triazine compound that contains trichloromethyl groups and a methylenedioxyphenyl moiety. This chemical is used in various industrial processes, including as a reactant in the production of pharmaceuticals and agrochemicals. It is a white crystalline solid and is insoluble in water, but soluble in organic solvents such as acetone, ether, and chloroform. The compound’s structure and properties make it useful in a range of applications, including as a building block in the synthesis of other compounds. However, it is important to handle this chemical with care due to its toxic and potentially hazardous properties.

Check Digit Verification of cas no

The CAS Registry Mumber 71255-78-2 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 7,1,2,5 and 5 respectively; the second part has 2 digits, 7 and 8 respectively.
Calculate Digit Verification of CAS Registry Number 71255-78:
(7*7)+(6*1)+(5*2)+(4*5)+(3*5)+(2*7)+(1*8)=122
122 % 10 = 2
So 71255-78-2 is a valid CAS Registry Number.
InChI:InChI=1/C12H5Cl6N3O2/c13-11(14,15)9-19-8(20-10(21-9)12(16,17)18)5-1-2-6-7(3-5)23-4-22-6/h1-3H,4H2

71255-78-2SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 12, 2017

Revision Date: Aug 12, 2017

1.Identification

1.1 GHS Product identifier

Product name 2-(1,3-Benzodioxol-5-yl)-4,6-bis(trichloromethyl)-1,3,5-triazine

1.2 Other means of identification

Product number -
Other names 2-(1,3-benzodioxol-5-yl)-4,6-bis(trichloromethyl)-1,3,5-triazine

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:71255-78-2 SDS

71255-78-2Upstream product

71255-78-2Downstream Products

71255-78-2Relevant articles and documents

Compounds for use in a positive-working resist composition

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, (2008/06/13)

Proposed is novel compounds for use in a chemical-sensitization positive-working photoresist composition used in the photolithographic patterning process for the manufacture of fine electronic devices, which is capable of giving, with high photosensitivity to ArF excimer laser beams, a patterned resist layer having an excellently orthogonal cross sectional profile and high resistance against dry etching and exhibiting good adhesion to the substrate surface. While the composition comprises (A) a film-forming resinous ingredient which causes an increase of alkali solubility by interacting with an acid and (B) a radiation-sensitive acid-generating agent, the most characteristic feature of the invention consists in the use of a specific acrylic resin as the component (A), which comprises the monomeric units of a (meth)acrylic acid ester of hydroxy bicyclo?3.1.1!heptanone unsubstituted or substituted by an alkyl group such as hydroxypinanone (meth)acrylate, optionally, in combination with the monomeric units derived from (meth)acrylic acid and/or tert-butyl (meth)acrylate in a molar fraction of 3:7 to 7:3.

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