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71552-44-8

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71552-44-8 Usage

Check Digit Verification of cas no

The CAS Registry Mumber 71552-44-8 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 7,1,5,5 and 2 respectively; the second part has 2 digits, 4 and 4 respectively.
Calculate Digit Verification of CAS Registry Number 71552-44:
(7*7)+(6*1)+(5*5)+(4*5)+(3*2)+(2*4)+(1*4)=118
118 % 10 = 8
So 71552-44-8 is a valid CAS Registry Number.

71552-44-8Upstream product

71552-44-8Downstream Products

71552-44-8Relevant articles and documents

Aromatic Sulphonation. Part 91. The Sulphonation of Anisole, Phenol, Phenyl Methanesulphonate, Potassium Phenyl Sulphate, and a Series of Methyl-, Bromo-, and Chloro-substituted Anisoles and Phenols in Concentrated Aqueous Sulphuric Acid

Cerfontain, Hans,Lambrechts, Hans J. A.,Schaasberg-Nienhuis, Zwaan R. H.,Coombes, Robert G.,Hadjigeorgiou, Panicos,Tucker, Geoffrey

, p. 659 - 668 (2007/10/02)

The (homogeneous) sulphonation of a number of aromatic ethers and alcohols, viz. anisole (1), 3-methyl- (2), 4-methyl- (3), 2-bromo- (4), 4-bromo- (5), 2-chloro- (6), and 4-chloro-anisole (7), phenol (8), 2-methyl- (9), 3-methyl- (10), 4-methyl- (11), 4-bromo- (12), 2-chloro- (13), and 4-chloro-phenol (14), phenyl methanesulphonate (15), and potassium phenyl sulphate (16) in concentrated aqueous sulphuric acid at 25.0 deg C has been studied, and rates and isomer distributions have been determined.The sulphonation is first-order in the aromatic substrate, and from the rate measurements it is concluded that the species undergoing sulphonation in the phenyl ring is an unprotonated substrate species.In the lower acid concentrations the sulphonating entity is H3SO4(1+).With increasing sulphuric acid concentration there is a gradual change-over in the sulphonating entity from H3SO4(1+) to H2S2O7.The acid concentrations of equal rate contribution by the two entities for anisole and phenol are 87 and 90 +/- 1percent, respectively.Sulphonation on the oxygen atom (i.e., sulphation) does not occur.The o/p-ratios for (1) and (8) do not vary over the studied sulphuric acid range of 75-90percent H2SO4.Partial rate factors for the 2- and 4-position of (1) and (8) are reported.The very low partial rate factors for the 4-substitution of (1) and (8) and the observed extreme suppression and compression of the reactivities of the substrates (1)-(14) are ascribed to hydrogen bonding of the substrates with the acidic solvent species present.It is tentatively suggested that the relatively high contents of sulphonation ortho to -OR with anisole (36percent) and phenol (48percent) are due to specific complexation of the substrates with the sulphonating electrophile.

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