7327-60-8Relevant articles and documents
POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS
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, (2010/04/23)
A positive resist composition comprises (A) a resin component which becomes soluble in an alkaline developer under the action of an acid and (B) an acid generator. The resin (A) is a polymer comprising recurring units containing a non-leaving hydroxyl group represented by formula (1) wherein R1 is H, methyl or trifluoromethyl, X is a single bond or methylene, m is 1 or 2, and the hydroxyl group attaches to a secondary carbon atom. The composition is improved in resolution when processed by lithography.
Amine compounds, resist compositions and patterning process
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, (2008/06/13)
Amine compounds having a cyano group are useful in resist compositions for preventing a resist film from thinning and also for enhancing the resolution and focus margin of resist.
EQUILIBRIUM OF α-AMINOACETONITRILE FORMATION FROM FORMALDEHYDE, HYDROGEN CYANIDE AND AMMONIA IN AQUEOUS SOLUTION: INDUSTRIAL AND PREBIOTIC SIGNIFICANCE
Moutou, G.,Taillades, J.,Benefice-Malouet, S.,Commeyras, A.,Messina, G.,Mansani, R.
, p. 721 - 730 (2007/10/02)
The equilibrium constant, Kan(H2CO), for the formation of α-aminoacetonitrile from formaldehyde, ammonia and hydrogen cyanide was evaluated at 25 deg C.A first estimation of Kan(H2CO) was obtained from extrathermodynamic relationships of the type log K' vs Σ?*.The final value was then obtained from a comparison of the experimental and calculated pH dependences of α-hydroxy- and α-aminoacetonitrile concentrations.From these results, it appears that, after equilibrium, the ratio between the concentrations of the two precursors glycine and hydroxyethanoic acid, is a linear function of the concentration of free ammonia, i.e. /=21 at 25 deg C.
