75-37-6Relevant articles and documents
Kim et al.
, p. 725,726, 729, 731, 733 (1973)
Copper-Mediated Aromatic 1,1-Difluoroethylation with (1,1-Difluoroethyl)trimethylsilane (TMSCF2CH3)
Li, Xinjin,Zhao, Jingwei,Wang, Yunze,Rong, Jian,Hu, Mingyou,Chen, Dingben,Xiao, Pan,Ni, Chuanfa,Wang, Limin,Hu, Jinbo
, p. 1789 - 1792 (2016/07/07)
A new method for the formation of 1,1-difluoroethyl copper species (“CuCF2CH3”) with 1,1-difluoroethylsilane (TMSCF2CH3) has been developed. The “CuCF2CH3” species can be applied to the efficient 1,1-difluoroethylation of diaryliodonium salts under mild conditions, affording (1,1-difluoroethyl)arenes in good to excellent yields. This convenient procedure tolerates a wide range of functional groups and thus serves as a practical synthetic tool for the introduction of CF2CH3 group(s) into complex molecules.
Vapor phase hydrofluorination of acetylene to vinyl fluoride over La2O3-Al2O3 catalysts
Bi, Qing-Yuan,Qian, Lin,Xing, Li-Qiong,Tao, Li-Ping,Zhou, Qiang,Lu, Ji-Qing,Luo, Meng-Fei
body text, p. 528 - 533 (2009/12/29)
A series of La-doped Al2O3 catalysts were prepared and tested for the vapor phase hydrofluorination of C2H2 to vinyl fluoride (CH2CHF, VF). It was found that the La-doped catalyst gave a stable cataly
PURIFICATION METHOD, PRODUCTION PROCESS, AND USE OF, 1, 1-DIFLUOROETHANE
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Page/Page column 16-17, (2008/06/13)
Crude 1,1-difluoroethane containing at least one compound selected from the group consisting of unsaturated compounds each having two carbon atoms within the molecule and saturated chlorine-containing compounds each having two carbon atoms within the molecule is brought into contact with a zeolite and/or a carbonaceous adsorbent, or crude 1,1-difluoroethane containing hydrogen fluoride and, as impurities, at least one compound selected from the group consisting of unsaturated compounds each having two carbon atoms within the molecule is brought into contact with a fluorination catalyst in a gas phase state. High-purity 1,1-difluoroethane usable as a cryogenic refrigerant, or as an etching gas, can be produced in an industrially advantageous manner.