937250-56-1Relevant articles and documents
Fluorine-contained photoacid generators (PAGs) and corresponding polymer resists
Wang, Mingxing,Yueh, Wang,Gonsalves, Kenneth E.
, p. 607 - 612 (2008/12/22)
A new series of fluorinated anionic photoacid generators (PAGs) (F4-MBS-TPS, F4VBzBS-TPS, F4-IBBS-TPS, CF3 MBS-TPS, MTFBS-TPS and VBzTFBS-TPS), and corresponding PAG bound polymeric resists (HS-EA-PAG) based on hydroxystyrene (HOST) and 2-ethyl-2-adamanty