15310-28-8

Basic information

• Product Name: BIS-(TOLUENE-4-SULFONYL)-METHANE
• Synonyms: BIS-(TOLUENE-4-SULFONYL)-METHANE;Bis(p-toluenesulfonyl)methane, 97%;1-methyl-4-[(4-methylphenyl)sulfonylmethylsulfonyl]benzene
• CAS NO: 15310-28-8
• Molecular Formula: C₁₅H₁₆O₄S₂
• Molecular Weight: 324.41514
• Mol File: 15310-28-8.mol
• Article Data: 8

Chemical Properties

• Melting Point: 137-139℃
• Boiling Point: 557.6°Cat760mmHg
• Flash Point: 367.2°C
• Appearance: /
• Density: 1.298g/cm³
• Vapor Pressure: 6.78E-12mmHg at 25°C
• Refractive Index: 1.578
• CAS DataBase Reference: BIS-(TOLUENE-4-SULFONYL)-METHANE(CAS DataBase Reference)
• NIST Chemistry Reference: BIS-(TOLUENE-4-SULFONYL)-METHANE(15310-28-8)
• EPA Substance Registry System: BIS-(TOLUENE-4-SULFONYL)-METHANE(15310-28-8)

Safety Data

• Hazard Codes: Xi
• Statements: 36
• WGK Germany: 3
• HazardClass: IRRITANT
• Hazardous Substances Data: 15310-28-8(Hazardous Substances Data)

Usage

General Description

BIS-(TOLUENE-4-SULFONYL)-METHANE, also known as Methylene bis(4-methylbenzenesulfonate), is a chemical compound that is commonly used as a crosslinking agent in the production of polyurethane foams and plastics. It is also used as a curing agent in the manufacture of epoxy resins. The compound is a white crystalline powder with a low vapor pressure and high thermal stability, making it suitable for use in a variety of industrial applications. However, it is important to handle this compound with care, as it is considered to be harmful if ingested or inhaled, and can cause skin and eye irritation. Proper safety precautions should be taken when working with BIS-(TOLUENE-4-SULFONYL)-METHANE to avoid any potential health risks.

InChI:InChI=1/C15H16O4S2/c1-12-3-7-14(8-4-12)20(16,17)11-21(18,19)15-9-5-13(2)6-10-15/h3-10H,11H2,1-2H3

Upstream product

• 917-64-6 methyl magnesium iodide 
• 60-29-7 diethyl ether 
• 455-16-3 p-toluenesulfonyl fluoride 
• 17241-04-2 bis(p-tolylthio)methane 
• 17067-32-2 2,2-bis(p-tolylthio)acetic acid 
• 676-58-4 methylmagnesium chloride 
• 917-54-4 methyllithium 
• 107555-82-8 3-(p-tolylsulfonyl)-1,2,3-benzoxathiazole 2,2-dioxide 
• 50-00-0 formaldehyd 
• 106-45-6 para-thiocresol 
• 24768-49-8 (Dichlormethylen)sulfoxid 
• 824-79-3 sodium 4-methylbenzenesulfinate 
• 873410-85-6 bis-(toluene-4-sulfonyl)-acetic acid amide 
• 110-82-7 cyclohexane 

Downstream Products

• 103329-66-4 4-[bis-(tolyl-4-sulfonyl)-methyl]-2-phenyl-4H-chromene 
• 72834-71-0 2-Methyl-1,1-ditosylpropan 
• 14159-45-6 bis(p-tolylsulfonyl)diazomethane 
• 39837-40-6 1,1,3,3-Tetrakis-p-tosylpropan 
• 121434-39-7 phenyliodonium bis(p-tolylsulphonyl)methylide 
• 65649-93-6 2,2-Bis-(toluene-4-sulfonyl)-vinylamine 
• 83252-95-3 C₂₇H₂₄ClO₄PS₂ 
• 15717-50-7 E-ditosylethene 
• 13792-47-7 Bis-(p-tolylsulfonyl)-formaldehyd-o-chlorphenylhydrazon 
• 24866-03-3 N-[Bis-(toluene-4-sulfonyl)-methylene]-N'-(2-nitro-phenyl)-hydrazine 
• 24865-88-1 Di(4-methyl-3-nitrophenylsulfonyl)methan 
• 18087-01-9 bis(p-tolylsulfonyl)dichloromethane 
• 18086-97-0 bis(p-tolylsulfonyl)dibromomethane 
• 18097-21-7 chlorobis(toluene-4-sulfonyl)methane 

Relevant articles and documents

Photochemistry of Bis(sulfonyl)diazomethanes

The photochemistry of a series of bis(sulfonyl)diazomethanes was investigated in solution and in low temperature matrices. These diazo compounds are of interest as photoacid generators in photoresists for deep UV lithography. Triplet carbenes could be trapped in solution, but attempts to isolate the carbenes in argon matrices at 10 K were unsuccessful, the corresponding sulfenes and other rearranged products being observed under these conditions instead. This is in line with DFT and ab initio calculations, which predict the singlet carbenes to be transition states on the pathway to oxathiirene oxides, which can be looked upon as intramolecularly stabilized carbenes. The triplet carbenes lie energetically above the singlet transition states and so are not expected to have a prolonged lifetime even in low-temperature matrices.

Nitrogen-containing organic compound, resist composition and patterning process

Resist compositions comprising nitrogen-containing organic compounds having a benzimidazole structure and a specific ether chain moiety have an excellent resolution, form precisely configured patterns with minimized roughness of sidewalls and are useful in microfabrication using electron beams or deep-UV light.

Sulfonylation of Organometallic Reagents with Arenesulfonyl Fluorides: A Simple One-Step Synthesis of Sulfones

Sulfonylation of organometallic reagents was accomplished with arenesulfonyl fluorides to provide a wide variety of alkylaryl- and diaryl sulfones.Organolithium and diorganocopper lithium reagents react smoothly with arenesulfonyl fluorides to give sulfones in high yields.Alkyl Grignard reagents often lead to mixtures of monosulfonylated and disulfonylated products.However, allylmagnesium chloride and phenylmagnesium chloride provide the corresponding sulfones in excellent yields.Organocopper reagents were also found to yield sulfones upon treatment with arenesulfonyl fluorides.By utilizing this methodology, synthetically useful alkyl, (trimethylsilyl)methyl, and allyl sulfones are easily prepared in high yields.