2386-47-2

Basic information

• Product Name: 1-Butanesulfonic acid
• Synonyms: butane-1-sulfonic acid;BUTANESULFONIC ACID;1-BUTANESULFONIC ACID;Butane-1-sulphonic acid;BUTANESULPHONICACID;1-Butanesulfonic acid,99%,pract.;2386-54-1 (Hydrochloride salt);Einecs 219-198-7
• CAS NO: 2386-47-2
• Molecular Formula: C₄H₁₀O₃S
• Molecular Weight: 138.19
• EINECS: 219-198-7
• Mol File: 2386-47-2.mol
• Article Data: 16

Chemical Properties

• Melting Point: -15.1°C
• Boiling Point: 223.6°C (rough estimate)
• Appearance: /liquid
• Density: 1.1850
• Refractive Index: 1.4640 (estimate)
• PKA: 1.92±0.50(Predicted)
• Stability: Incompatible with strong oxidizing agents, bases.
• CAS DataBase Reference: 1-Butanesulfonic acid(CAS DataBase Reference)
• NIST Chemistry Reference: 1-Butanesulfonic acid(2386-47-2)
• EPA Substance Registry System: 1-Butanesulfonic acid(2386-47-2)

Safety Data

• Hazardous Substances Data: 2386-47-2(Hazardous Substances Data)

Usage

Description

1-Butanesulfonic acid, also known as butylsulfonic acid, is an alkanesulfonic acid in which the alkyl group directly linked to the sulfo functionality is butyl. It possesses unique chemical properties due to its butyl chain and sulfonic acid group, making it a versatile compound in various applications.

Uses

Used in Chemical Synthesis:
1-Butanesulfonic acid is used as a reagent in the chemical synthesis of various organic compounds. Its strong acidic properties and solubility in organic solvents make it a suitable catalyst or reactant in the production of pharmaceuticals, dyes, and other specialty chemicals.
Used in Analytical Chemistry:
1-Butanesulfonic acid is used as a mobile phase additive in high-performance liquid chromatography (HPLC) and other analytical techniques. Its ability to interact with various analytes and improve peak shape and resolution makes it a valuable tool in the separation and identification of complex mixtures.
Used in Environmental Applications:
1-Butanesulfonic acid is used as a component in the treatment of industrial wastewater and soil remediation processes. Its strong acidic properties and ability to form complexes with heavy metals and other pollutants make it an effective agent for the removal of contaminants from the environment.
Used in Material Science:
1-Butanesulfonic acid is used as a functional group in the synthesis of novel materials, such as ion-exchange resins and specialty polymers. Its unique chemical properties contribute to the development of materials with enhanced performance characteristics, such as improved thermal stability and chemical resistance.

Synthesis Reference(s)

Tetrahedron Letters, 4, p. 1131, 1963 DOI: 10.1039/jr9630005127

InChI:InChI=1/C4H10O3S.Na/c1-2-3-4-8(5,6)7;/h2-4H2,1H3,(H,5,6,7);/q;+1/p-1

Upstream product

• 109-65-9 1-bromo-butane 
• 628-83-1 n-butylthiocyanate 
• 109-79-5 n-butanethiol 
• 109-69-3 n-Butyl chloride 
• 629-45-8 dibutyl disulfide 
• 5675-04-7 1-butanesulfinic acid 
• 106-97-8 n-butane 
• 54829-33-3 S-n-butyl cyclohexanecarbothioate 
• 7269-35-4 S-(n-butyl) benzothioate 
• 20195-07-7 S-butyl O,O-diethyl phosphorothioate 
• 2386-60-9 perfluoro-1-butanesulfonyl fluoride 
• 2374-68-7 ethyl 1-butanesulfonate 
• 18032-97-8 diethyl-thiophosphinsaeure-S-n-butylester 
• 50728-05-7 Ethyl-thiophosphonsaeure-O-ethyl-S-n-butylester 

Downstream Products

• 2386-60-9 perfluoro-1-butanesulfonyl fluoride 
• 7269-35-4 S-(n-butyl) benzothioate 
• 629-45-8 dibutyl disulfide 
• 62926-90-3 2-Methoxy-6-<(methylthio)methyl>aniline 
• 103578-32-1 N-(p-chloro-α,α,α-trifluoro-o-tolyl)S,S-dimethylsulfilimine 
• 2374-69-8 butane-1-sulfonic acid methyl ester 
• 4299-07-4 2-butyl-1,2-benzothiazolin-3-one 
• 179863-07-1 4-(3-methylimidazolium)butanesulfonate 

Relevant articles and documents

Synthesis, photophysical and photochemical properties of photoacid generators based on N-hydroxyanthracene-1,9-dicarboxyimide and their application toward modification of silicon surfaces

We have introduced a series of nonionic photoacid generators (PAGs) for carboxylic and sulfonic acids based on N-hydroxyanthracene-1,9-dicarboxyimide (HADI). The newly synthesized PAGs exhibited positive solvachromatic emission (λmax(hexane) 461 nm, λmax(ethanol) 505 nm) as a function of solvent polarity. Irradiation of PAGs in acetonitrile (ACN) using UV light above 410 nm resulted in the cleavage of weak Na-O bonds, leading to the generation of carboxylic and sulfonic acids in good quantum and chemical yields. Mechanism for the homolytic Na-O bond cleavage for acid generation was supported by time-dependent density functional theory (TD-DFT) calculations. More importantly, using the PAG monomer N-(p-vinylbenzenesulfonyloxy)anthracene- 1,9-dicarboxyimide (VBSADI), we have synthesized N-(p-vinylbenzenesulfonyloxy) anthracene-1,9-dicarboxyimidea-methyl methacrylate (VBSADI-MMA) and N-(p-vinylbenzenesulfonyloxy)anthracene-1,9-dicarboxyimidea-ethyl acrylate (VBSADI-EA) copolymer through atom transfer radical polymerization (ATRP). Finally, we have also developed photoresponsive organosilicon surfaces using the aforementioned polymers.

Development of 1-Hydroxy-2(1H)-quinolone-Based Photoacid Generators and Photoresponsive Polymer Surfaces

A new class of carboxylate and sulfonate esters of 1-hydroxy-2(1H)- quinolone has been demonstrated as nonionic photoacid generators (PAGs). Irradiation of carboxylates and sulfonates of 1-hydroxy-2(1H)-quinolone by UV light (γ≥310 nm) resulted in homolysis of weak N-O bond leading to efficient generation of carboxylic and sulfonic acids, respectively. The mechanism for the homolytic N-O bond cleavage was supported by time-dependent DFT calculations. Photoresponsive 1-(p-styrenesulfonyloxy)-2-quinolone-methyl methacrylate (SSQL-MMA) and 1-(p-styrenesulfonyloxy)-2-quinolone-lauryl acrylate (SSQL-LA) copolymers were synthesized from PAG monomer 1-(p-styrenesulfonyloxy) -2-quinolone, and subsequently controlled surface wettability was demonstrated for the above-mentioned photoresponsive polymers. Copyright

Selective oxidation reactions of diaryl- and dialkyldisulfides to sulfonic acids by CH3ReO3/hydrogen peroxide

Diaryl- and dialkyl disulfides were oxidized in acetonitrile at 20 °C by CH3ReO3/H2O2 oxidant system to yield selectively the corresponding sulfonic acids in short reaction times and in high yields.