3768-58-9 Usage
Description
Bis(dimethylamino)dimethylsilane is an organosilicon compound with the chemical formula (CH3)2N(Si(CH3)2)2N(CH3)2. It is a colorless liquid with a characteristic amine-like odor. Bis(dimethylamino)dimethylsilane is known for its reactivity and is commonly used in various chemical processes and applications.
Uses
Used in Chemical Vapor Deposition (CVD):
Bis(dimethylamino)dimethylsilane is used as a precursor in the chemical vapor deposition of silicon nitride films. It provides a uniform and high-quality film deposition, which is essential for various applications in the semiconductor and microelectronics industries.
Used in Atomic Layer Deposition (ALD):
Bis(dimethylamino)dimethylsilane is also used in the atomic layer deposition of SiNxCy dielectric sealing layers using plasma-enhanced atomic layer deposition (PE-ALD). It allows for precise control over the thickness and composition of the deposited layers, making it suitable for advanced electronic devices and components.
Used as a Reagent for Silylation:
Bis(dimethylamino)dimethylsilane is utilized as a reagent for silylation, a chemical process that involves the introduction of a silyl group (SiR3) to a molecule. This process is widely used in organic synthesis, chromatography, and the modification of surfaces to improve their properties.
Used in Silanization of pH-Sensitive Microelectrodes:
In the field of electrophysiology, Bis(dimethylamino)dimethylsilane has been used to silanize pH-sensitive microelectrodes. This silanization process enhances the sensitivity and stability of the microelectrodes, allowing for accurate measurements of membrane potential in oocytes during experiments related to the cloning and characterization of human electrogenic Na+-cotransporter isoform (hhNBC).
Used in Microelectrode Measurements for Carbon Dioxide Transport:
Bis(dimethylamino)dimethylsilane is also employed in microelectrode measurements for studying the transport of carbon dioxide through membranes. This application is crucial for understanding the mechanisms of gas exchange and developing new technologies for medical and environmental applications.
Used in Electronic Film Deposition:
Bis(dimethylamino)dimethylsilane plays a significant role in electronic film deposition, where it contributes to the formation of thin films with desired properties for use in electronic devices and sensors. Its reactivity and compatibility with various materials make it a valuable component in the fabrication process.
Check Digit Verification of cas no
The CAS Registry Mumber 3768-58-9 includes 7 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 4 digits, 3,7,6 and 8 respectively; the second part has 2 digits, 5 and 8 respectively.
Calculate Digit Verification of CAS Registry Number 3768-58:
(6*3)+(5*7)+(4*6)+(3*8)+(2*5)+(1*8)=119
119 % 10 = 9
So 3768-58-9 is a valid CAS Registry Number.
InChI:InChI=1/C6H18N2Si/c1-7(2)9(5,6)8(3)4/h1-6H3
3768-58-9Relevant articles and documents
Synthesis and characterisation of novel zirconium(IV) derivatives containing the bis-amido ligand SiMe2(NRR′)2
Passarelli, Vincenzo,Benetollo, Franco,Zanella, Pierino,Carta, Giovanni,Rossetto, Gilberto
, p. 1411 - 1418 (2003)
The silicon compounds SiMe2(NRR′)2 [NRR′ = NMe2 (1), NEt2 (2), NC4H8 (3), NHEt (4), NHiPr (5), NHtBu (6), NMeBu (7)] have been synthesised via aminolysis of the dichloro species SiMe2Cl 2 and their ligating ability has been investigated towards zirconium(IV). The dimer zirconium compound {Zr[(NiPr) 2SiMe2]2}2 (8) has been synthesised by reacting ZrCl4 with the lithium salt Li2[(N iPr)2SiMe2] and its molecular structure has been determined in the solid state by X-ray diffraction analysis. The reaction of ZrCl4 with SiMe2(NRR′)2 yields the Lewis adducts ZrCl4[(NRR′)2SiMe2] [NRR′ = NMe2 (10), NC4H8 (11), NHEt (12), NHiPr (13), NHtBu (14), NMeBu (15)]. On the other hand, the mixed amido derivative Zr(NMe2)3(NHMe)[(N′Bu) SiMe2(NH′Bu)] (9) has been obtained from the reaction of Zr(NMe2)4 with SiMe2(NHtBu) 2. The solution molecular structure and dynamics of the zirconium derivatives have been elucidated by 1D and 2D multinuclear NMR spectroscopy.
Complexation and Exchange Reactions of some Dimethylamino-substituted Group 4 Compounds
Wade, Steven R.,Willey, Gerald R.
, p. 1264 - 1267 (2007/10/02)
Reactions of CH2(NMe2)2, (1), SiMe2(NMe2)2, (2), (cp=η-cyclopentadienyl), (3), and , (4), with covalent metal halides MCl4 (M=Ti,Zr,Si,Ge,or Sn) and MCl3 (M=Ti,V,or Cr) fall into two categories: (a) N-donor chelation leading to complex formation and (b) halide-NMe2 exchange.Compound (1) gives 1:1 complexes with MCl4 (M=Ti or Sn) and 2:1 complex with VCl3.Compound (2) provides 1:1 complexes with MCl4 (M=Ti,Zr,Hf, or Sn).The decomposition of TiCl4*SiMe2(NMe2)2 --> invariably occurs in both the solid state and solution.There is no reaction of (2) with metal(III) chlorides.With MCl4 (M=Si or Ge 'scrambling' reactions involving halide-NMe2 exchange occur and these have been monitored by 1H n.m.r. spectroscopy.Reactions of (3) and (4) with MCl4 (M=Si,Ge,Sn,Ti,Zr,or Hf) consistently feature halide-NMe2 exchange rather than adduct formation.All complexes have been characterised by analytical and spectroscopic (1H n.m.r. and i.r.) investigations.
