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Name
TUNGSTENSILICIDE
- EINECS
- CAS No. 12627-41-7
- Density
- Solubility
- Melting Point
- Formula H4SiW
- Boiling Point
- Molecular Weight 215.96
- Flash Point
- Transport Information
- Appearance
- Safety
- Risk Codes
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Molecular Structure
- Hazard Symbols
- Synonyms
- PSA
- LogP
Tungsten silicide Chemical Properties
Systematic Name: Tungsten silicide
Molecular Formula: Si . W
Tungsten silicide (CAS NO.12627-41-7) is composed of two substances,so the molecular structure of it is:
Tungsten silicide Specification
A semiconductor manufacturing process for depositing a tungsten silicide film on a substrate includes deposition of a Tungsten silicide nucleation layer on the substrate using a (CVD) process with a silane source gas followed by deposition of the Tungsten silicide film with a dichlorosilane source gas. This two step process allows dichlorosilane to be used as a silicon source gas for depositing a Tungsten silicide film at a lower temperature than would otherwise by possible and without plasma enhancement. Tungsten silicide (CAS NO.12627-41-7) films deposited by this process are characterized by low impurities, good step coverage, and low stress with the silicon substrate.
Related Products
- Tungsten
- Tungsten antimonate
- Tungsten boride (W2B5)
- Tungsten boride (WB2)
- Tungsten bromide (WBr5)
- Tungsten carbide, mixed with cobalt (85%:15%)
- TUNGSTEN CARBIDE, mixed with COBALT (92%:8%)
- Tungsten carbide, mixed with cobalt and titanium (78%:14%:8%)
- Tungsten chloride oxide(WCl2O2), (T-4)- (9CI)
- Tungsten disulfide
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