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1388753-67-0

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1388753-67-0 Usage

Check Digit Verification of cas no

The CAS Registry Mumber 1388753-67-0 includes 10 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 7 digits, 1,3,8,8,7,5 and 3 respectively; the second part has 2 digits, 6 and 7 respectively.
Calculate Digit Verification of CAS Registry Number 1388753-67:
(9*1)+(8*3)+(7*8)+(6*8)+(5*7)+(4*5)+(3*3)+(2*6)+(1*7)=220
220 % 10 = 0
So 1388753-67-0 is a valid CAS Registry Number.

1388753-67-0Downstream Products

1388753-67-0Relevant articles and documents

Thio trifluoromethyl-containing compounds and methods for their preparation

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Paragraph 0219; 0220; 0221; 0222, (2016/10/17)

The invention discloses a compound containing trifluoromethylthio group and a preparation method thereof. The invention discloses a compound 7, compound 9 or compound 11 containing trifluoromethylthio group. The invention provides a preparation method of the compound 7, 9 or 11, which comprises the following steps: in an organic solvent, carrying out substitution reaction on a compound 1 and a beta-eleostearate compound 6 in the presence of an alkali to obtain the compound 7; in an organic solvent, carrying out substitution reaction on the compound 1 and an aldehyde or ketone compound 8 in the presence of a catalyst and an additive to obtain the compound 9; and under the gas protection, carrying out substitution reaction on the compound 1, cuprous iodide and an alkyne compound 10 in an organic solvent in the presence of an alkali to obtain the compound 11. The preparation method of the compound 7, 9 or 11containing trifluoromethylthio group has the advantages of mild reaction conditions, high conversion rate, high yield and low production cost, and is suitable for industrial production.

Metal-free oxidative trifluoromethylthiolation of terminal alkynes with CF3SiMe3 and elemental sulfur

Chen, Chao,Chu, Lingling,Qing, Feng-Ling

supporting information; experimental part, p. 12454 - 12457 (2012/09/05)

A metal-free oxidative trifluoromethyl-thiolation of terminal alkynes using readily available CF3SiMe3 and elemental sulfur at room temperature has been developed. This reaction provides an efficient and convenient method for the preparation of alkynyl trifluoromethyl sulfides bearing a wide range of functional groups. Preliminary investigation revealed that elemental sulfur instead of air acted as the oxidant.

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