1415833-11-2Relevant articles and documents
Salt, the composition and production of resist pattern
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, (2018/04/10)
PROBLEM TO BE SOLVED: To provide a salt to be used for a resist composition that allows production of a resist pattern with excellent pattern collapse resistance.SOLUTION: The salt is expressed by the formula (I). In the formula, Qand Qrepresent a fluorine atom or a perfluoroalkyl group having 1 to 6 carbon atoms; Lrepresents a carbonyl group or -CF-; Xrepresents a single bond, a divalent saturated hydrocarbon group having 1 to 14 carbon atoms which may have a substituent, or a group expressed by formula (a-1); c is 0 or 1; and X, X, A, Aand Aeach represent a specified group.