Trifluoromethane

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Purity Grade customized Formula CHF3 Application CHF3 is used in the semiconductor industry in plasma etching of silicon oxide and silicon …

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Purity Grade customized Formula CHF3 Application CHF3 is used in the semiconductor industry in plasma etching of silicon oxide and silicon nitride. Known as R-23 or HFC-23, it is also a useful refrigerant, sometimes as a replacement for Chlorotrifluoromethane (cfc-13) and is a byproduct of its manufacture. Molecular Weight 70.01g /mol Alternative name Fluoroform, Carbon trifluoride, Methyl trifluoride, Fluoryl, Freon 23, Arcton 1, HFC 23, R-23, FE-13, UN 1984 Package N/A

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