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Tetramethylammonium hydroxide N,N,N-Trimethylmethanaminium Hydroxide 75-59-2
Appearance: Colorless liquid
CAS NO.: 75-59-2
Formula: C4H13NO
M.W.: 91.15
Application:
Widely used in electronic industry , especially as positive resister developer ,silicon wafer wet etchant and super clean solution for CMP process. Also used in the manufacture of integrated circuits, liquid crystal displays, printed circuit boards, capacitors, sensors, and many other electronic components.
Appearance: Colorless liquid
CAS NO.: 75-59-2
Formula: C4H13NO
M.W.: 91.15
Application:
Widely used in electronic industry , especially as positive resister developer ,silicon wafer wet etchant and super clean solution for CMP process. Also used in the manufacture of integrated circuits, liquid crystal displays, printed circuit boards, capacitors, sensors, and many other electronic components.
Melting point | °C |
Boiling point | 110 °C |
density | 0.866 g/mL at 25 °C |
vapor pressure | 17.5 mm Hg ( 20 °C) |
refractive index | n20/D 1.384 |
Fp | 80 °F |
storage temp. | 2-8°C |
Sensitive | Air Sensitive |
Merck | 14,9224 |
BRN | 3558708 |
Stability: | Stable. Flammable. Incompatible with strong oxidizing agents, strong acids. |
CAS DataBase Reference | 75-59-2(CAS DataBase Reference) |
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