(Trimethyl)methylcy...

(Trimethyl)methylcyclopentadienylplatinum(IV)
(Trimethyl)methylcyclopentadienylplatinum(IV)
(Trimethyl)methylcyclopentadienylplatinum(IV)

(Trimethyl)methylcyclopentadienylplatinum(IV)

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1 Gram

Negotiable

  • Min.Order :1 Gram
  • Purity: 99%
  • Payment Terms : L/C,D/A,D/P,T/T,Other

Keywords

Noble metal catalyst 94442-22-5 high purity Noble metal catalyst

Quick Details

  • Appearance:off-white Powder
  • Application:Noble metal catalyst
  • PackAge:drum
  • ProductionCapacity:1|Kilogram|Month
  • Storage:2-8°C
  • Transportation:According to your request

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Product Name: (Trimethyl)methylcyclopentadienylplatinum(IV)
Synonyms: Methylcyclopentadienyl trimethyl platinum;Trimethyl(methylcyclopentadienyl)platinum(IV) packaged for use in deposition systems;(Trimethyl)methylcyclopentadienylplatinum(IV), 99%, 78-1350, contained in 50 ml Swagelok cylinder for CVD/ALD;(TriMethyl)MethylcyclopentadienylplatinuM(IV),98%;(η5-methylcyclopentadienyl)trimethylplatinum(IV);(TriMethyl)MethylcyclopentadienylplatinuM(IV), 99%, 78-1350, contained in 50 Ml Swagelokcylinder high teMperature valve (96-1071) for CVD/ALD
CAS: 94442-22-5
MF: C9H9Pt
MW: 312.26
EINECS: 629-612-1
Product Categories: Pt;ALD Precursors;Platinum;Precursors by Metal;Vapor Deposition Precursors;metallocene
Mol File: 94442-22-5.mol
Uses Platinum complex widely used in CVD and ALD applications due, in part, to its simplicity (only C,H and Pt), volatility and moderate decomposition temperatures.
Chemical Properties white to off-white crystals or crystalline powder
Uses (Trimethyl)methylcyclopentadienylplatinum(IV) was used for the deposition of ultrathin metallic layers of platinum by electron beam induced deposition, atomic sputtering.These deposits find application in microelectronics, catalysis, photonics and chemical sensing.
Uses Trimethyl(methylcyclopentadienyl)platinum(IV) is used as an organometallic precursor for platinum. It is used in the microelectronics, catalysis, photonics and chemical sensing processes. It is used for the deposition of ultrathin metallic layers of platinum by the electron beam induced deposition process.
Uses Precursors Packaged for Depositions Systems
General Description Trimethyl(methyl cyclopentadienyl)platinum(IV) ( MeCpPtMe3) is a commonly used organometallic precursor for platinum.

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We can provide customers with small quantities with gram level for laboratories research to tonnage level for industrial production Synthesis capacity from 1 liter to 5000 liter is available.


 

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