Boron oxide 1303-86-2

Min.Order / FOB Price:Get Latest Price

1 Kilogram	FOB Price:USD 15.0000 -50.0000

1 Kilogram

FOB Price:USD 15.0000 -50.0000

Min.Order :1 Kilogram
Purity: >99%
Payment Terms : L/C,D/A,D/P,T/T

Keywords

Boron trioxide dioxodiboroxane Boron(III) oxide

Quick Details

Appearance:White crystalline powder
Application:Organic raw material，
PackAge:5mg/vial, 10 vials per box
ProductionCapacity:3000|Kilogram|Month
Storage:Inert atmosphere,Room Temperature
Transportation:EMS,DHL,?TNT,?UPS?,FEDEX,?BY?AIR,?BY?SEADHL?Express,?FedEx?and?EMS?for?quantity?less?than?50KG,?usually?called?as?DDU?service;?Sea?shipping?for?quantity?over?500KG;?And?air?shipping?is?available

Superiority:

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Our products are sold all over Europe,North&South America, Sino-East, Asia and pacific area as well as Africa,we establish long term.

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Company cooperates with research institutes. We strictly control the process of raw materials up to finished product.

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Quick and clear response to customers questions. Warm after sale service, we will help to solve the problems in your usage.

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Details:

Molecular Formula	B2O3
Molar Mass	69.62
Density	2.46g/mLat 25°C(lit.)
Melting Point	450°C(lit.)
Boling Point	1860 °C
Flash Point	1860°C
Water Solubility	36 g/L (25 ºC)
Solubility	36g/l
Vapor Presure	1Pa
Vapor Density	>1 (vs air)
Appearance	White crystalline powder
Specific Gravity	2.46 +/- 0.01
Color	White
Odor	Odorless
Exposure Limit	ACGIH: TWA 10 mg/m3OSHA: TWA 15 mg/m3NIOSH: IDLH 2000 mg/m3; TWA 10 mg/m3
Merck	14,1337
PH	4 (10g/l, H2O, 25℃)
Storage Condition	Inert atmosphere,Room Temperature
Stability	Stable. Moisture sensitive. Incompatible with water.
Sensitive	Hygroscopic
MDL	MFCD00011315
Physical and Chemical Properties	Properties of colorless glass-like crystals or powder. The surface is greasy and tasteless. relative density 2.46 solubility soluble in acid, ethanol, hot water, slightly soluble in cold water.
Use	Used as a flux, also used in glass, enamel, manufacturing boron compound raw materials and color TV industry It can be used as the doping source of semiconductor silicon and the flux in the decomposition of silicate, and can also be used in the manufacture of boron