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  • Reaction mechanisms and kinetics of the elimination processes of 2-CHLOROETHYLSILANE (cas 18165-19-0) and derivatives: A DFT study using CTST, RRKM, and BET theories
  • Add time:07/18/2019         Source:sciencedirect.com

    The thermal decomposition kinetics of 2-CHLOROETHYLSILANE (cas 18165-19-0) and derivatives in the gas phase has been studied computationally using density functional theory, along with various exchange-correlation functionals (UM06-2x and ωB97XD) and the aug-cc-pVTZ basis set. The calculated energy profile has been supplemented with calculations of kinetic rate constants under atmospheric pressure and in the fall-off regime, using transition state theory (TST) and statistical Rice–Ramsperger–Kassel–Marcus (RRKM) theory. Activation energies and rate constants obtained using the UM06-2x/aug-cc-pVTZ approach are in good agreement with the experimental data. The decomposition of 2-chloroethyltriethylsilane species into the related products [C2H4 + Et3SiCl] is characterized by 6 successive structural stability domains associated to the sequence of catastrophes C8H19SiCl: 6-C†FCC†[FF]-0: C6H15SiCl + C2H4. Breaking of Si–C bonds and formation of Si–Cl bonds occur in the vicinity of the transition state.

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    Prev:Dramatic Enhancement of Reactivity of Organosilicon Compounds Induced by Complexation of Bis(allyl)silanes with Fluoride Ion
    Next: Conformational stabilities, ab initio calculations and structural parameters for 2-chloroethyl silane and 2-chloroethyl trifluorosilane)

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