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  • Crystal structure of carbon-implanted titanium, vanadium and chromium
  • Add time:08/02/2019         Source:sciencedirect.com

    The dose dependence on crystal structures and lattice parameters of carbon-implanted layers of polycrystalline titanium, vanadium and chromium plates has been investigated by X-ray diffraction (XRD) measurements. Implantations of 12C+-ions were performed at doses between 1 × 1017 and 2 × 1018 ions/cm2 at 100 keV, and at room temperature. The formation of titanium carbide is characterized only in the B1(NaCl)-type structure in the entire implant dose range, and its lattice parameter mostly agrees with that of monocarbide TiC at higher doses. For vanadium, the B1-type carbide grows preferentially with the dose increment. Its lattice parameter suggests the formation of nearly monocarbide V4C3 at the highest dose. For chromium, only a cubic carbide peculiar to carbon implantation, of which the lattice of chromium atoms is fcc having lattice parameter equal to the diagonal line segment size of the bcc lattice, is found to crystallize at doses over 5 × 1017 ions/cm2. Carbides of titanium and vanadium formed by carbon implantation correspond to those expected by a standard equilibrium with the system of carbon and the respective metal. The formation process of a particular phase will be discussed for chromium carbide.

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    Prev:Initial stage of Free Pressureless Spark-Plasma Sintering of vanadium carbide: Determination of surface diffusion parameters
    Next: Vacancy distribution in nonstoichiometric vanadium monoxide)

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