Add time:08/11/2019         Source:sciencedirect.com

Gold deposits on p-silicon substrates from Chloroauric acid (cas 16903-35-8) solutions have been obtained by the electroless photochemical deposition technique. A low-power incident laser beam (1 mW) was used with the intention of preventing the thermal decomposition of the precursor compound in the solution or pyrolytic effects at the substrate surface. Deposited spots of gold dots had diameters of 25–100 μm. The dots writing periods were in the range of 1–3 min. The surface morphology of the deposits was observed by SEM (scanning electron microscopy) and AFM (atomic force microscopy). The deposited patterns obtained at room temperature consist of columnar structures with characteristics grain dimensions of the order of 0.3–1.5 μm. Single-crystalline fcc-gold structures were observed for longer exposure times in the range 15–20 min.

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